SCHEMBL8093712

SCHEMBL8093712

COC(C)OC=Cc1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.44
HTR2A P28223 3/20 0.40
NFE2L2 Q16236 1/20 0.40
MAOB P27338 1/20 0.39
TUBB4A P04350 1/20 0.39
TUBB P07437 1/20 0.39
TUBA3C P0DPH7 1/20 0.39
TUBA1B P68363 1/20 0.39
TUBA4A P68366 1/20 0.39
TUBB4B P68371 1/20 0.39
TUBB3 Q13509 1/20 0.39
TUBB2A Q13885 1/20 0.39
TUBB8 Q3ZCM7 1/20 0.39
TUBA3E Q6PEY2 1/20 0.39
TUBA1A Q71U36 1/20 0.39
TUBA1C Q9BQE3 1/20 0.39
TUBB6 Q9BUF5 1/20 0.39
TUBB2B Q9BVA1 1/20 0.39
TUBB1 Q9H4B7 1/20 0.39
CYP1A1 P04798 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3367705 0.82 HTR2A (0.39) TRPA1HTR2AMAOBAHRNPC1
SCHEMBL23134220 0.81 MAOB (0.44) TRPA1HTR2AMAOBAHRNPC1
SCHEMBL419698 0.81 MAOB (0.44) TRPA1HTR2AMAOBAHRNPC1
SCHEMBL7133262 0.79 MAPT (0.47) TRPA1NFE2L2MAOBCYP1A1CYP1A2
SCHEMBL8004384 0.79 HTR2A (0.37) TRPA1HTR2AMAOBAHRNPC1
SCHEMBL1395549 0.79 RELA (0.44) TRPA1HTR2ANPC1MTORTP53
SCHEMBL4543866 0.77 MEN1 (0.39) TRPA1HTR2ACYP1A2NPC1MTOR
SCHEMBL6055046 0.76 HTR2A (0.44) TRPA1HTR2AMAOBCYP1A2NPC1
SCHEMBL29266723 0.75 RELA (0.41) HTR2AMAOBCYP1A2NPC1MTOR
SCHEMBL18140874 0.75 HTR2A (0.38) TRPA1HTR2ANPC1MTORTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102243386-B Liquid crystal display cells, positive radiation line sensitive compositions, interlayer dielectric used for liquid crystal display element and forming method thereof JSR株式会社 2016-08-10 CN disclosed
CN-102243386-A Liquid crystal display device, positive radiation-sensitive composition, interlayer insulating film for liquid crystal display device and method for forming the same JSR CORP 2011-11-16 CN disclosed
CN-1751269-A Halogenated oxime derivatives and their use as latent acids CIBA SC HOLDING AG (CH) 2006-03-22 CN disclosed
CN-1628268-A Sulfonic acid derivatives and their use as latent acids CIBA SC HOLDING AG (CH) 2005-06-15 CN disclosed
EP-1059314-A1 A resist composition Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
US-5670299-A COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
EP-0704762-A1 Resist material and pattern formation WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1996-04-03 EP disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed
EP-0588544-A2 Fine pattern forming material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1994-03-23 EP disclosed
EP-0520642-A1 Resist material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-12-30 EP disclosed