SCHEMBL8095669

SCHEMBL8095669

C=COCCc1cccc2c1[nH]c1ccccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 5/20 0.42
MAPT P10636 2/20 0.40
MAPK1 P28482 2/20 0.40
NPSR1 Q6W5P4 2/20 0.40
GABRP O00591 2/20 0.38
GABRD O14764 2/20 0.38
GABRA1 P14867 2/20 0.38
GABRB1 P18505 2/20 0.38
GABRG2 P18507 2/20 0.38
GABRB3 P28472 2/20 0.38
GABRA5 P31644 2/20 0.38
GABRA3 P34903 2/20 0.38
GABRA2 P47869 2/20 0.38
GABRB2 P47870 2/20 0.38
GABRA4 P48169 2/20 0.38
GABRE P78334 2/20 0.38
GABRA6 Q16445 2/20 0.38
GABRG1 Q8N1C3 2/20 0.38
GABRG3 Q99928 2/20 0.38
GABRQ Q9UN88 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28242459 0.85 KIF11 (0.45) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL29238357 0.81 KIF11 (0.44) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL10936968 0.80 KIF11 (0.46) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL8413774 0.80 THRB (0.46) KIF11MAPTMAPK1NPSR1PARP14
SCHEMBL159977 0.78 KIF11 (0.50) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL28810572 0.78 KIF11 (0.44) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL11577428 0.77 KIF11 (0.53) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL241852 0.76 KIF11 (0.49) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL29376743 0.76 KIF11 (0.49) KIF11MAPTMAPK1NPSR1GABRP
SCHEMBL29291020 0.76 KIF11 (0.52) KIF11MAPTMAPK1NPSR1GABRP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6017681-A EDGE JOINING OPTICAL PARTS BY APPLYING PHOTOSENSITIVE ADHESIVE TO SEPARATE EDGES AND IRRADIATING TO FORM WAVEGUIDES, THEN MATING EDGES AND HEATING TO MELT AND FUSE WAVEGUIDE MATERIAL FUJITSU LIMITED (JP) 2000-01-25 US disclosed
US-5902715-A FORMING A MIRROR-FINISHED SURFACE AT A BOUNDARY BETWEEN A AN IRRADIATED AND A NON-IRRADIATED WAVEGUIDE BY OBLIQUELY IRRADIATING THE WAVEGUIDE; REFRACTIVE INDEX MAY BE INCREASED BY HEATING IRRADIATED PORTION, OR WITH A CATALYZER FUJITSU LIMITED (JP) 1999-05-11 US disclosed
US-5861444-A COPOLYMER BINDER, PHOTOSENSITIVE MONOMER, PHOTOPOLYMERIZATION INITIATOR FUJITSU LIMITED (JP) 1999-01-19 US disclosed
US-5658966-A Method of coupling optical parts and refractive index imaging material FUJITSU LIMITED (JP) 1997-08-19 US disclosed
US-5581646-A Method of coupling optical parts and refractive index imaging material FUJITSU LIMITED (JP) 1996-12-03 US disclosed
US-4581311-A POLYVINYL CARBAZOLE DERIVATIVE PHOTOCONDUCTOR; ELECTROPHOTOGRAPHIC PHOTORECEPTOR, FLEXIBILITY FUJI PHOTO FILM CO., LTD. (JP) 1986-04-08 US disclosed
US-4535042-A Electrophotographic photosensitive member with electron donor and acceptor layers CANON KABUSHIKI KAISHA, A CORP. OF JAPAN (JP) 1985-08-13 US disclosed
US-4500623-A Photoconductive compositions comprising an organic photoconductor and a thioamide compound and electrophotographic light-sensitive materials using the compositions FUJI PHOTO FILM CO., LTD. (JP) 1985-02-19 US disclosed
US-4499167-A Photoconductive compositions comprising an organic photoconductor and an amide compound and electro-photographic light-sensitive materials using the compositions FUJI PHOTO FILM CO., LTD. (JP) 1985-02-12 US disclosed
US-4480020-A Polymeric photoconductive sensitized by bis(β-cyano-β-alkoxycarbonylvinyl)benzene FUJI PHOTO FILM CO., LTD. (JP) 1984-10-30 US disclosed
US-4447515-A DIACYLAMINE COMPOUND ADDED FUJI PHOTO FILM CO., LTD. (JP) 1984-05-08 US disclosed
US-4444863-A UREA COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1984-04-24 US disclosed
US-4358521-A ELECTROGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1982-11-09 US disclosed
US-4184871-A A,B-UNSATURATED NITRILE SENSITIZER MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1980-01-22 US disclosed