SCHEMBL8097299

SCHEMBL8097299

OCCCC(O)C(O)C(CO)CO

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
TDP1 Q9NUW8 1/20 0.35
THRB P10828 1/20 0.33
CYP2D6 P10635 2/20 0.31
SPHK1 Q9NYA1 1/20 0.31
GMNN O75496 1/20 0.31
POLB P06746 1/20 0.31
THPO P40225 1/20 0.31
MTOR P42345 1/20 0.31
BLM P54132 1/20 0.31
KDM4E B2RXH2 1/20 0.31
TP53 P04637 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
MAPT P10636 1/20 0.31
CETP P11597 1/20 0.31
HTT P42858 1/20 0.31
UBE2N P61088 1/20 0.31
PTPN1 P18031 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15861490 0.83 THRB (0.43) LMNAL3MBTL1TDP1THRB
SCHEMBL26921972 0.83 LMNA (0.44) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL21477 0.81 LMNA (0.42) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL15484312 0.81 LMNA (0.53) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL28991932 0.81 LMNA (0.61) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL28366140 0.80 LMNA (0.48) LMNAL3MBTL1CYP2D6SPHK1GMNN
SCHEMBL30610933 0.79 TDP1 (0.63) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL28092770 0.79 TDP1 (0.63) LMNAL3MBTL1TDP1THRBCYP2D6
SCHEMBL1043717 0.79 LMNA (0.41) LMNAL3MBTL1THRBCYP2D6SPHK1
SCHEMBL27477369 0.79 TDP1 (0.63) LMNAL3MBTL1TDP1THRBCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6042994-A FORMING A NANOPOROUS DIELECTRIC COMPOSITION ON A SUBSTRATE, OPTIONALLY SURFACE MODIFYING IT, OPTIONALLY HEATING TO EVAPORATE SOLVENT, EXPOSING TO ELECTRON BEAM RADIATION, AND OPTIONALLY THERMAL ANNEALING; STRENGTH, SOLVENT RESISTANCE ALLIEDSIGNAL INC. (US) 2000-03-28 US disclosed