SCHEMBL8098285

SCHEMBL8098285

CCOC(=O)C1(O)CC2C=CC1C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 2/20 0.40
CYP2D6 P10635 1/20 0.40
OPRM1 P35372 3/20 0.33
LMNA P02545 1/20 0.33
POLB P06746 1/20 0.31
ADAM17 P78536 1/20 0.31
SLC22A1 O15245 2/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
GRM1 Q13255 1/20 0.30
BLM P54132 1/20 0.30
PMP22 Q01453 1/20 0.30
KDM4E B2RXH2 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2C9 P11712 1/20 0.30
TSHR P16473 1/20 0.30
NFKB1 P19838 1/20 0.30
RECQL P46063 1/20 0.30
OPRD1 P41143 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7211051 0.82 CYP2C19 (0.41) CYP2C19CYP2D6OPRM1LMNAPOLB
SCHEMBL200228 0.81 CYP2C19 (0.40) CYP2C19CYP2D6OPRM1LMNAPOLB
SCHEMBL32688968 0.79 CYP2D6 (0.42) CYP2C19CYP2D6OPRM1LMNAPOLB
SCHEMBL27619841 0.78 CYP2D6 (0.38) CYP2C19CYP2D6OPRM1LMNAPOLB
SCHEMBL11703278 0.77 CYP2D6 (0.37) CYP2C19CYP2D6OPRM1LMNAADAM17
SCHEMBL11703272 0.77 CYP2D6 (0.37) CYP2C19CYP2D6OPRM1LMNAADAM17
SCHEMBL25428359 0.76 CYP2D6 (0.36) CYP2C19CYP2D6OPRM1LMNASLC22A1
SCHEMBL5838108 0.76 CYP2D6 (0.36) CYP2C19CYP2D6OPRM1LMNAADAM17
SCHEMBL5837506 0.76 CYP2D6 (0.36) CYP2C19CYP2D6OPRM1LMNAADAM17
SCHEMBL1141594 0.76 CYP2D6 (0.36) CYP2C19CYP2D6OPRM1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6165672-A Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-12-26 US disclosed