SCHEMBL8100608

SCHEMBL8100608

C[Si](C)(CCl)OCc1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
IDO1 P14902 1/20 0.41
AGXT P21549 1/20 0.40
ALDH1A1 P00352 3/20 0.39
L3MBTL1 Q9Y468 2/20 0.38
MAPK1 P28482 2/20 0.38
MAPT P10636 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
PKM P14618 1/20 0.38
TP53 P04637 2/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
LMNA P02545 2/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
CYP1A2 P05177 1/20 0.35
PTGS1 P23219 1/20 0.35
SLC6A2 P23975 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11672508 0.84 TSHR (0.41) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL28012339 0.81 TSHR (0.46) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL8101238 0.80 SMN1; SMN2 (0.40) IDO1ALDH1A1TDP1NPC1RAB9A
SCHEMBL2844263 0.78 TSHR (0.52) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL766784 0.78 TSHR (0.52) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL9930083 0.78 TSHR (0.52) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL11671588 0.78 TSHR (0.43) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL6036848 0.77 IDO1 (0.48) IDO1L3MBTL1NPC1RAB9ALMNA
SCHEMBL5934052 0.76 TSHR (0.41) TSHRIDO1AGXTALDH1A1L3MBTL1
SCHEMBL7917734 0.74 TSHR (0.48) TSHRIDO1AGXTALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-5622784-A WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM SEIKO EPSON CORPORATION (JP) 1997-04-22 US disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed