SCHEMBL8100617

SCHEMBL8100617

C=C[Si](C)(C)OCc1ccco1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
TDP1 Q9NUW8 2/20 0.41
HPGD P15428 2/20 0.41
USP2 O75604 1/20 0.41
GAA P10253 1/20 0.41
SLC1A3 P43003 1/20 0.39
SLC1A2 P43004 1/20 0.39
SLC1A1 P43005 1/20 0.39
MAPT P10636 5/20 0.38
MAPK1 P28482 3/20 0.38
LMNA P02545 1/20 0.37
HTT P42858 3/20 0.36
CYP2D6 P10635 2/20 0.36
KMT2A Q03164 2/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C19 P33261 2/20 0.36
CYP3A4 P08684 1/20 0.36
NPSR1 Q6W5P4 2/20 0.34
SARM1 Q6SZW1 1/20 0.34
VSIR Q9H7M9 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10956915 0.84 ALDH1A1 (0.43) ALDH1A1TDP1HPGDUSP2GAA
SCHEMBL11418453 0.79 ALDH1A1 (0.53) ALDH1A1TDP1GAASLC1A3SLC1A2
SCHEMBL8833152 0.79 ALDH1A1 (0.53) ALDH1A1TDP1GAASLC1A3SLC1A2
SCHEMBL287571 0.79 ALDH1A1 (0.53) ALDH1A1TDP1GAASLC1A3SLC1A2
SCHEMBL10958448 0.77 ALDH1A1 (0.41) ALDH1A1TDP1HPGDUSP2GAA
SCHEMBL288183 0.77 ALDH1A1 (0.50) ALDH1A1TDP1HPGDUSP2GAA
SCHEMBL13452758 0.74 ALDH1A1 (0.49) ALDH1A1TDP1GAASLC1A3SLC1A2
SCHEMBL11431883 0.74 ALDH1A1 (0.49) ALDH1A1TDP1GAASLC1A3SLC1A2
SCHEMBL11418456 0.74 ALDH1A1 (0.49) ALDH1A1TDP1GAASLC1A3SLC1A2
SCHEMBL11618786 0.73 ALDH1A1 (0.52) ALDH1A1TDP1HPGDGAASLC1A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-6001165-A FOR INK JET PRINTERS WHICH ABSORBS INK RAPIDLY, DOES NOT BLOT, WATER RESISTANCE OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1999-12-14 US disclosed
EP-0887200-A1 Coating composition for recording material and process for producing recording material OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1998-12-30 EP disclosed
CN-1203250-A Coating composition for recording material and process for producing recording material OJI YUKA SYNT PAPER CO LTD (JP) 1998-12-30 CN disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed