SCHEMBL8100620

SCHEMBL8100620

CC(OC=C([SiH3])OC(C)c1ccco1)c1ccco1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.34
KMT2A Q03164 4/20 0.33
POLB P06746 2/20 0.33
PKM P14618 1/20 0.33
PTPN1 P18031 1/20 0.33
PTPN7 P35236 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MEN1 O00255 3/20 0.32
MAPT P10636 3/20 0.32
KDM4E B2RXH2 2/20 0.32
ALDH1A1 P00352 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
HPGD P15428 2/20 0.30
AGTR1 P30556 1/20 0.30
MAPK1 P28482 1/20 0.30
HSD17B10 Q99714 1/20 0.30
GAA P10253 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30322580 0.73 ALOX5 (0.42) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL6846713 0.72 ALOX5 (0.40) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL28089140 0.71 HCAR2 (0.51) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL1258862 0.69 ALOX5 (0.53) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL27884913 0.69 KMT2A (0.42) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL1153462 0.68 ALOX5 (0.41) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL7108625 0.67 NPC1 (0.44) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL28089141 0.67 HCAR2 (0.62) ALOX5KMT2APOLBPKMPTPN1
Tetrahydrofuran SCHEMBL28992325 0.66 HPGD (0.38) ALOX5KMT2APOLBPKMPTPN1
Ammonia Solution, Strong SCHEMBL7020677 0.66 HCAR2 (0.60) ALOX5KMT2APOLBPKMPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0700951-B1 Polyorganosiloxane and process for producing the same SHOWA DENKO KK (JP) 2000-12-27 EP disclosed
US-6001165-A FOR INK JET PRINTERS WHICH ABSORBS INK RAPIDLY, DOES NOT BLOT, WATER RESISTANCE OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1999-12-14 US disclosed
EP-0887200-A1 Coating composition for recording material and process for producing recording material OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) 1998-12-30 EP disclosed
CN-1203250-A Coating composition for recording material and process for producing recording material OJI YUKA SYNT PAPER CO LTD (JP) 1998-12-30 CN disclosed
EP-0700951-A1 Polyorganosiloxane and process for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-03-13 EP disclosed
US-5491203-A COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS SHOWA DENKO K. K. (JP) 1996-02-13 US disclosed