Diphenylether

Diphenylether

SCHEMBL8103449

CCCCO.c1ccc(Oc2ccccc2)cc1

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 9/20 0.64
TSHR P16473 2/20 0.52
ALDH1A1 P00352 4/20 0.49
MAPT P10636 3/20 0.49
HTT P42858 2/20 0.49
GAA P10253 1/20 0.49
KMT2A Q03164 1/20 0.49
NPSR1 Q6W5P4 1/20 0.49
HDAC3 O15379 1/20 0.49
HSD17B10 Q99714 1/20 0.47
NR1H2 P55055 1/20 0.46
BAX Q07812 1/20 0.46
LMNA P02545 2/20 0.46
HPGD P15428 1/20 0.46
POLB P06746 1/20 0.45
ATM Q13315 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
RECQL P46063 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylether SCHEMBL9122165 0.92 LTA4H (0.56) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL1756150 0.89 LTA4H (0.60) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL9334093 0.86 LTA4H (0.76) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL1373717 0.86 LTA4H (0.63) LTA4HTSHRALDH1A1GAAKMT2A
Anisole SCHEMBL9360868 0.85 CA4 (0.58) LTA4HALDH1A1HTTHDAC3LMNA
Diphenylether SCHEMBL20163306 0.84 LTA4H (0.67) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL11183529 0.84 LTA4H (0.73) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL11074700 0.84 LTA4H (0.73) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL11264556 0.84 LTA4H (0.73) LTA4HTSHRALDH1A1MAPTHTT
Diphenylether SCHEMBL28176491 0.84 LTA4H (0.73) LTA4HTSHRALDH1A1MAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6025113-A FOR PREPARING HIGHLY SENSITIVE NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL DEVELOPABLE WITH ALKALINE AQUEOUS SOLUTION IN SHORT TIME WITH HIGH RESOLUTION HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-02-15 US disclosed