Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,4-Butanediol SCHEMBL5927815 | 1.00 | SMN1; SMN2 (0.38) | SMN1; SMN2LMNAALDH1A1HSD17B10MEN1 | |
| 1,6-Hexanediol SCHEMBL5611536 | 0.97 | LMNA (0.41) | SMN1; SMN2LMNAALDH1A1HSD17B10MEN1 | |
| 1,6-Hexanediol SCHEMBL5611532 | 0.97 | LMNA (0.41) | SMN1; SMN2LMNAALDH1A1HSD17B10MEN1 | |
| 1,3-Propanediol SCHEMBL5927829 | 0.94 | ALDH1A1 (0.33) | SMN1; SMN2LMNAALDH1A1HSD17B10MEN1 | |
| Ethylene Glycol SCHEMBL9436952 | 0.88 | TSHR (0.33) | TSHR | |
| Ethylene Glycol SCHEMBL5612095 | 0.88 | TSHR (0.33) | TSHR | |
| Ethylene Glycol SCHEMBL27425654 | 0.88 | TSHR (0.33) | TSHR | |
| Ethylene Glycol SCHEMBL5611801 | 0.80 | — | — | |
| Ethylene Glycol SCHEMBL1476998 | 0.80 | — | — | |
| Ethylene Glycol SCHEMBL5611756 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2813892-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2020-06-17 | — | — | EP | disclosed |
| US-10228621-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-12 | — | — | US | disclosed |
| EP-2813890-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-2813889-B1 | Photoresist underlayer film-forming composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-2813891-B1 | Photoresist underlayer film-forming composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-9620363-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9136121-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9136122-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| EP-2813892-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| EP-2813890-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| EP-2813889-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| EP-2813891-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |
| US-20140363958-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363957-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363955-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363956-A1 | UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-6048661-A | POLYMER WITH HYDROXY AND CARBOXY GROUPS AND ETHER ESTER GROUPS FOR PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-04-11 | — | — | US | disclosed |