Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.65 |
| ▸ | CA2 | P00918 | 3/20 | 0.65 |
| ▸ | CA7 | P43166 | 2/20 | 0.65 |
| ▸ | CA9 | Q16790 | 2/20 | 0.65 |
| ▸ | CA12 | O43570 | 1/20 | 0.65 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.65 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.64 |
| ▸ | ACHE | P22303 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL3457091 | 0.97 | CA1 (0.61) | CA1CA2CA7CA9CA12 | |
| SCHEMBL24821015 | 0.92 | CA4 (0.62) | CA1CA2CA7CA9CA12 | |
| SCHEMBL24820976 | 0.92 | CA4 (0.62) | CA1CA2CA7CA9CA12 | |
| SCHEMBL24822136 | 0.90 | ACHE (0.71) | CA1CA2CA7CA9CA12 | |
| SCHEMBL24823108 | 0.82 | MAOA (0.51) | CA1CA2CA7CA9CA12 | |
| Pyridine SCHEMBL1173624 | 0.82 | CA1 (0.47) | CA1CA2CA7CA9CA12 | |
| 1,4-Dimethoxybenzene SCHEMBL21802643 | 0.80 | CA1 (1.00) | CA1CA2CA7CA9CA12 | |
| 1,4-Dimethoxybenzene SCHEMBL8489 | 0.80 | CA1 (1.00) | CA1CA2CA7CA9CA12 | |
| SCHEMBL22193386 | 0.80 | CA1 (0.61) | CA1CA2CA7CA9CA12 | |
| SCHEMBL16653533 | 0.79 | CA1 (0.67) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2464670-B1 | PROCESSES FOR CONTROLLING THE VISCOSITY OF POLYALPHAOLEFINS | CHEMTURA CORP (US) | 2014-11-19 | — | — | EP | claimed |
| US-20110040052-A1 | Processes for Controlling the Viscosity of Polyalphaolefins | LANXESS SOLUTIONS US INC. | 2011-02-17 | — | — | US | claimed |
| US-6225426-B1 | LIQUID PHASE POLYMERIZATION OF ETHYLENE, ALPHA-OLEFIN AND DIENE IN PRESENCE OF CATALYST COMPRISING MIXTURE OF METALLOCENE PROCATALYST AND ALUMINOXANE OR ALUMINOXANE AND TRIALKYLALUMINUM COMPOUND TOPRODUCE ELASTOMER | UNIROYAL CHEMICAL COMPANY, INC. | 2001-05-01 | — | — | US | claimed |
| US-6147025-A | SUBSTITUTING PART OR ALL OF THE ALUMINOXANE COCATALYST WITH A CATION-GENERATING COCATALYST | UNIROYAL CHEMICAL COMPANY, INC, (US) | 2000-11-14 | — | — | US | claimed |
| US-6136744-A | CATION-GENERATING COCATALYST COMPRISES A METAL COMPONENT, E.G., AN ALUMINUM COMPOUND, (2) A NEUTRAL METAL CONTAINING COMPONENT, E.G., A BORANE COMPOUND, AND (3) AN ANIONIC METAL COMPONENT, E.G., A METAL TETRAKIS(TETRAFLUOROPHENYL)BORATE. | UNIROYAL CHEMICAL COMPANY, INC. (US) | 2000-10-24 | — | — | US | claimed |
| US-6060572-A | LIQUID PHASE POLYMERIZATION OF ETHYLENE AND AT LEAST ONE OTHER ALPHA-OLEFIN USING A BULKY METALLOCENE CATALYST ACTIVATED BY AN ALUMOXANE OR A CATION-GENERATING METALLOCENE; HIGH MOLECULAR WEIGHT; HIGH VISCOSITY; LOW POLYDISPERSITY | UNIROYAL CHEMICAL COMPANY, INC. (US) | 2000-05-09 | — | — | US | claimed |
| CN-117950268-A | Photoinitiation system for preparing holographic plastic with high photosensitivity and application thereof | 华中科技大学 | 2024-04-30 | — | — | CN | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-4800149-A | FREE RADICAL GENERATION AND CROSSLINKING | THE MEAD CORPORATION (US) | 1989-01-24 | — | — | US | disclosed |
| US-4788124-A | IONIC DYE-REACTIVE COUNTER ION COMPOUND | THE MEAD CORPORATION (US) | 1988-11-29 | — | — | US | disclosed |
| US-4772530-A | XANTHENE AND OXONOL DYES | THE MEAD CORPORATION (US) | 1988-09-20 | — | — | US | disclosed |
| US-4772541-A | SENSITIVE AT LONGER WAVELENGTHS | THE MEAD CORPORATION (US) | 1988-09-20 | — | — | US | disclosed |
| EP-0277034-A2 | Lamination of two substrates | THE MEAD CORPORATION (US) | 1988-08-03 | — | — | EP | disclosed |
| US-4751102-A | FOR PHOTOHARDENABLE FREE RADICAL ADDITION POLYMERIZABLE OR CROSSLINKABLE COMPOUND | THE MEAD CORPORATION (US) | 1988-06-14 | — | — | US | disclosed |
| EP-0223587-A1 | Photosensitive materials containing ionic dye compounds as initiators | THE MEAD CORPORATION (US) | 1987-05-27 | — | — | EP | disclosed |