⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL325170 | 0.61 | — | — | |
| SCHEMBL1156928 | 0.55 | — | — | |
| SCHEMBL13555402 | 0.55 | — | — | |
| Hydrogen Sulfide SCHEMBL7784683 | 0.55 | — | — | |
| Methane SCHEMBL397821 | 0.50 | CA1 (0.33) | — | |
| Nitrous Acid SCHEMBL20212027 | 0.50 | — | — | |
| SCHEMBL6751604 | 0.50 | — | — | |
| Formaldoxime SCHEMBL7264705 | 0.50 | — | — | |
| SCHEMBL192315 | 0.50 | — | — | |
| SCHEMBL10793299 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118369388-A | Water paint | 株式会社钟化 | 2024-07-19 | — | — | CN | disclosed |
| CN-115485336-B | Curing catalyst for curing polymer, method for producing same, moisture-curable composition, and method for producing cured product | 日东化成株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-115516041-B | Curing catalyst for curing polymer, method for producing same, moisture-curable composition, and method for producing cured product | 日东化成株式会社 | 2024-06-28 | — | — | CN | disclosed |
| CN-115461414-B | Curing catalyst for curing polymer, method for producing same, moisture-curable composition, and method for producing cured product | 日东化成株式会社 | 2024-06-25 | — | — | CN | disclosed |
| US-11993727-B2 | Antifouling coating film and method of manufacturing same, water contacting structure with antifouling coating film, and antifouling tape and method of manufacturing same | CHUGOKU MARINE PAINTS, LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| CN-115485337-B | Curing catalyst for curing polymer, method for producing same, moisture-curable composition, and method for producing cured product | 日东化成株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-117999324-A | Antifouling coating composition | 中国涂料株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117794960-A | Hydrophilic copolymers and hydrophilic compositions | 信越化学工业株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-114728275-B | Curing catalyst for curing polymer, moisture-curable composition, and method for producing cured product | 日东化成株式会社 | 2024-02-20 | — | — | CN | disclosed |
| CN-114729155-B | Moisture-curable composition and method for producing cured product | 日东化成株式会社 | 2024-02-13 | — | — | CN | disclosed |
| US-6812315-B2 | LATENT CURING AGENT FOR EPOXY RESIN | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20030187176-A1 | Oxazolidine compound and curable resin composition | YOKOHAMA RUBBER CO., LTD., THE (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030107465-A1 | Passive element component and substrate with built-in passive element | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-06-12 | — | — | US | disclosed |
| US-6528604-B1 | For coatings exhibiting excellent scratch resistance, weather resistance, adhesiveness and curability; polymerizable unsaturated group bonded via a silyloxy group | DSM N.V. (NL) | 2003-03-04 | — | — | US | disclosed |
| US-20030022102-A1 | Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-01-30 | — | — | US | disclosed |
| US-6160067-A | Reactive silica particles, process for manufacturing the same, use of the same | DSM N.V. (NL) | 2000-12-12 | — | — | US | disclosed |
| EP-0877777-B1 | REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME | DSM NV (NL) | 2000-01-05 | — | — | EP | disclosed |
| US-5994007-A | FORMING A SEMICONDUCTOR INTEGRATED CIRCUIT PATTERN INCLUDING FINE PATTERNS WITH A HIGH SUPERPOSING ACCURACY AND WITH A HIGH THROUGH-PUT. | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-11-30 | — | — | US | disclosed |
| EP-0877777-A1 | REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME | DSM N.V. (NL) | 1998-11-18 | — | — | EP | disclosed |
| WO-1997012942-A1 | REACTIVE SILICA PARTICLES, PROCESS FOR MANUFACTURING THE SAME, USE OF THE SAME | DSM N.V. (NL) | 1997-04-10 | — | — | WO | disclosed |