Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.33 |
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | RAB9A | P51151 | 3/20 | 0.33 |
| ▸ | XBP1 | P17861 | 2/20 | 0.33 |
| ▸ | PAX8 | Q06710 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | PTBP1 | P26599 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | TNFSF10 | P50591 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5000086 | 0.82 | NPC1 (0.35) | NPC1HTTRAB9AXBP1PAX8 | |
| SCHEMBL14911105 | 0.77 | — | — | |
| SCHEMBL3294509 | 0.77 | NPC1 (0.31) | NPC1HTTRAB9AXBP1PAX8 | |
| SCHEMBL5176036 | 0.73 | — | — | |
| SCHEMBL9625954 | 0.72 | NPC1 (0.33) | NPC1HTTRAB9AXBP1PAX8 | |
| SCHEMBL3220940 | 0.65 | — | — | |
| SCHEMBL7597320 | 0.48 | TDP1 (0.50) | LMNA | |
| Chloroform SCHEMBL2084455 | 0.47 | — | — | |
| Chloroform SCHEMBL10950487 | 0.47 | LMNA (1.00) | LMNA | |
| Chloroform SCHEMBL11043408 | 0.47 | LMNA (1.00) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 588 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12422750-B2 | Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| CN-111566560-B | Photosensitive resin composition, partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2024-09-17 | — | — | CN | disclosed |
| CN-117043273-A | Resin composition, cured product, laminate, method for producing cured product, and semiconductor device | 富士胶片株式会社 | 2023-11-10 | — | — | CN | disclosed |
| US-20230213858-A1 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| CN-116234845-A | Method for producing cured product, method for producing laminate, and method for producing semiconductor device | 富士胶片株式会社 | 2023-06-06 | — | — | CN | disclosed |
| CN-115989457-A | Method for producing cured product, method for producing laminate, and method for producing semiconductor device | 富士胶片株式会社 | 2023-04-18 | — | — | CN | disclosed |
| CN-115867866-A | Method for producing cured product, resin composition, developer, method for producing laminate, and method for producing semiconductor device | 富士胶片株式会社 | 2023-03-28 | — | — | CN | disclosed |
| WO-2022265030-A1 | METHOD FOR MANUFACTURING PERMANENT FILM, METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING DEVICE, AND PERMANENT FILM | 富士フイルム株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022244717-A1 | COMPOSITION FOR FORMING POLYIMIDE-CONTAINING PART, JOINED BODY MANUFACTURING METHOD, JOINED BODY, DEVICE MANUFACTURING METHOD AND DEVICE | 富士フイルム株式会社 | 2022-11-24 | — | — | WO | disclosed |
| WO-2022230899-A1 | JOINED BODY MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND RESIN COMPOSITION | 富士フイルム株式会社 | 2022-11-03 | — | — | WO | disclosed |
| EP-0557555-B1 | Photopolymerizable composition | MITSUBISHI CHEM CORP (JP) | 1995-09-20 | — | — | EP | disclosed |
| EP-0572524-A1 | RED SENSITIVE PHOTOPOLYMERIZABLE COMPOSITIONS. | DU PONT (US) | 1993-12-08 | — | — | EP | disclosed |
| EP-0557555-A1 | Photopolymerizable composition | Mitsubishi Chemical Corporation (JP) | 1993-09-01 | — | — | EP | disclosed |
| US-5219709-A | Addition polymerizable unsaturated compound, photoinitiator system of squarylium dye and halomethyl-s-triazine compound | MITSUBISHI KASEI CORPORATION (JP) | 1993-06-15 | — | — | US | disclosed |
| US-5147758-A | Containing squarylium dye, boron anion initiator | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-15 | — | — | US | disclosed |
| WO-1992014765-A1 | RED SENSITIVE PHOTOPOLYMERIZABLE COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-03 | — | — | WO | disclosed |
| EP-0379200-A2 | Photopolymerizable composition | MITSUBISHI KASEI CORPORATION (JP) | 1990-07-25 | — | — | EP | disclosed |
| EP-0313007-A2 | Mixture polymerised by visible light | HOECHST CELANESE CORPORATION (US) | 1989-04-26 | — | — | EP | disclosed |
| US-4340419-A | S-triazine herbicidal antidotes | STAUFFER CHEMICAL COMPANY (US) | 1982-07-20 | — | — | US | disclosed |
| US-4259432-A | HIGH SENSITIVITY TO ULTRAVIOLET RADIATION AND ARGON LASER RAYS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-31 | — | — | US | disclosed |