Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.71 |
| ▸ | ESR1 | P03372 | 5/20 | 0.71 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.71 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.71 |
| ▸ | TSHR | P16473 | 2/20 | 0.57 |
| ▸ | AR | P10275 | 1/20 | 0.57 |
| ▸ | HPGD | P15428 | 1/20 | 0.57 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.57 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.57 |
| ▸ | HTR6 | P50406 | 1/20 | 0.57 |
| ▸ | ESRRG | P62508 | 1/20 | 0.57 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | TYR | P14679 | 1/20 | 0.42 |
| ▸ | ALDH5A1 | P51649 | 1/20 | 0.41 |
| ▸ | ABAT | P80404 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bisphenol A SCHEMBL21433064 | 0.94 | ESR1 (0.64) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bisphenol A SCHEMBL8816213 | 0.94 | ESR1 (0.64) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bisphenol A SCHEMBL30655322 | 0.94 | ESR1 (0.64) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bisphenol A SCHEMBL29368155 | 0.88 | ESR1 (0.55) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Propene SCHEMBL28307569 | 0.87 | ESR1 (0.80) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bicarbonate SCHEMBL23683863 | 0.87 | ESR1 (0.87) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bicarbonate SCHEMBL21681661 | 0.87 | ESR1 (0.87) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bicarbonate SCHEMBL1031673 | 0.87 | ESR1 (0.87) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Formaldehyde SCHEMBL4390414 | 0.87 | ESR1 (0.87) | ALDH1A1ESR1ESR2CYP3A4TSHR | |
| Bisphenol A SCHEMBL29388682 | 0.85 | ESR1 (0.52) | ALDH1A1ESR1ESR2CYP3A4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12612479-B2 | Cross-linkable compositions having a low viscosity for coatings and materials with a high refractive index and a high heat deflection temperature | ARKEMA FRANCE (FR) | 2026-04-28 | — | — | US | claimed |
| US-7799844-B2 | Active energy beam-curable composition for optical material | TOAGOSEI CO., LTD. (JP) | 2010-09-21 | — | — | US | claimed |
| JP-9325486-A | — | — | None | — | — | JP | disclosed |
| US-12612479-B2 | Cross-linkable compositions having a low viscosity for coatings and materials with a high refractive index and a high heat deflection temperature | ARKEMA FRANCE (FR) | 2026-04-28 | — | — | US | disclosed |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-03-05 | — | — | US | disclosed |
| CN-120129876-A | Negative photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film | 旭化成株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-118938601-A | Negative photosensitive resin composition and method for producing cured relief pattern | 旭化成株式会社 | 2024-11-12 | — | — | CN | disclosed |
| WO-2024225072-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND CURED FILM | 旭化成株式会社 | 2024-10-31 | — | — | WO | disclosed |
| WO-2024219463-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND CURED FILM | 旭化成株式会社 | 2024-10-24 | — | — | WO | disclosed |
| WO-2024210063-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, CURED FILM, AND SEMICONDUCTOR DEVICE | 旭化成株式会社 | 2024-10-10 | — | — | WO | disclosed |
| CN-116964139-B | Photoinitiator resin with dibenzoylmethane substructure | 太阳化学有限公司 | 2024-07-12 | — | — | CN | disclosed |
| EP-1447712-A1 | METHODS OF PRODUCING PHOTOSENSITIVE CERAMIC COMPOSITION AND MULTI−LAYER SUBSTRATE USING IT | TORAY INDUSTRIES, INC. (JP) | 2004-08-18 | — | — | EP | disclosed |
| WO-2004033511-A1 | PHOTOCURABLE RESIN COMPOSITION AND OPTICAL MATERIAL | DSM IP ASSETS B.V. (NL) | 2004-04-22 | — | — | WO | disclosed |
| US-6630287-B2 | Coating the photosensitive paste on a substrate to a thickness in consideration of the photocurable depth known beforehand, exposing, developing; rectangular cross-section and superior high-frequency transmission | MURATA MANUFACTURING CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-6527984-B1 | Low temperature-curable anisotropically electroconductive connecting material for connecting and bonding electronic radical polymerization and cross-linking with itself; | SONY CHEMICALS CORPORATION (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20020076657-A1 | Method for forming thick film pattern and photosensitive paste used therefor | MURATA MANUFACTURING CO., LTD. | 2002-06-20 | — | — | US | disclosed |
| US-6399282-B1 | Method for forming conductive pattern and producing ceramic multi-layer substrate | MURATA MANUFACTURING CO., LTD. (JP) | 2002-06-04 | — | — | US | disclosed |
| EP-1094474-A2 | Low temperature-curable connecting material for anisotropically electroconductive connection | SONY CHEMICALS CORPORATION (JP) | 2001-04-25 | — | — | EP | disclosed |
| US-6183669-B1 | Paste composition, circuit board using the same, ceramic green sheet, ceramic substrate, and method for manufacturing ceramic multilayer substrate | MURATA MANUFACTURING CO., LTD. (JP) | 2001-02-06 | — | — | US | disclosed |
| JP-H09325486-A | PHOTOSENSITIVE RESIN COMPOSITION AND LAYERED PRODUCT USING THE SAME | NIPPON SYNTHETIC CHEM IND CO LTD:THE | 1997-12-16 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12612479-B2 | Cross-linkable compositions having a low viscosity for coatings and materials with a high refractive index and a high heat deflection temperature | MACF1, HTR3D, CD40 | ALDH1A1 56/4885ESR1 1568/4885ESR2 1933/4885 |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ARCN1, PBRM1, LCP1 | ALDH1A1 1600/4885ESR1 1954/4885ESR2 2848/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.