SCHEMBL8137247

SCHEMBL8137247

CC(C)(c1cccc(Cl)c1)c1cccc(Cl)c1

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.50
ESR2 Q92731 2/20 0.50
CNR1 P21554 3/20 0.44
CNR2 P34972 3/20 0.44
CYP19A1 P11511 2/20 0.44
KIF11 P52732 2/20 0.43
ALDH1A1 P00352 2/20 0.42
TSHR P16473 1/20 0.42
SCN5A Q14524 3/20 0.39
SCN9A Q15858 3/20 0.39
PNMT P11086 2/20 0.38
CYP3A4 P08684 1/20 0.38
PGR P06401 1/20 0.38
MAPK1 P28482 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL78619 0.85 HDAC4 (0.47) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL29441583 0.85 HDAC4 (0.47) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL19806049 0.83 ESR1 (0.42) ESR1ESR2CNR1CNR2CYP19A1
SCHEMBL17428948 0.83 ESR1 (0.38) ESR1ESR2CNR1CNR2CYP19A1
SCHEMBL12811806 0.83 ALDH1A1 (0.43) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL11469047 0.83 CYP19A1 (0.43) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL8633370 0.83 CYP19A1 (0.43) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL3096971 0.81 CYP19A1 (0.42) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL21791918 0.81 CYP19A1 (0.42) CYP19A1KIF11ALDH1A1TSHRSCN5A
SCHEMBL1859294 0.81 KIF11 (0.44) CYP19A1KIF11ALDH1A1TSHRSCN5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6018055-A MADE FROM A 1,3,5,7-TETRAOXO,2,6-DISUBSTITUTED,4,8-DI(NITRO OR HALO)BENZO(1,2-C:4,5-C')DIPYRROLE OF GIVEN FORMULA AND AN OPTIONALLY SUBSTITUTED AROMATIC RING, ALIPHATIC RING, OR HETEROAROMATIC RING DIOL; HEAT RESISTANT ENGINEERING PLASTIC KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2000-01-25 US claimed
US-7858291-B2 imagewise exposure, protective layer comprises water-soluble polyvinyl alcohol; phosphonium salts FUJIFILM CORPORATION (JP) 2010-12-28 US disclosed
US-7858291-B2 imagewise exposure, protective layer comprises water-soluble polyvinyl alcohol; phosphonium salts FUJIFILM CORPORATION (JP) 2010-12-28 US disclosed
US-20070092836-A1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2007-04-26 US disclosed
US-20070092836-A1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2007-04-26 US disclosed
EP-0693094-A1 HIGH IMPACT POLYESTER/POLYCARBONATE BLENDS AlliedSignal Inc. (US) 1996-01-24 EP disclosed
WO-1994022955-A1 HIGH IMPACT POLYESTER/POLYCARBONATE BLENDS ALLIEDSIGNAL INC. (US) 1994-10-13 WO disclosed
US-5283285-A Comprising an amine functionalized elastomer, a graft coupling agent; molding materials for sport, technical, household equipement; heat and chemical resistance ALLIEDSIGNAL INC. (US) 1994-02-01 US disclosed