SCHEMBL813764

SCHEMBL813764

CC[N+]1(c2ccccc2)CC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 3/20 0.41
CYP1A2 P05177 1/20 0.38
CYP2C9 P11712 1/20 0.38
TP53 P04637 1/20 0.36
LMNA P02545 2/20 0.33
THRB P10828 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
CYP3A4 P08684 1/20 0.31
ALOX15 P16050 1/20 0.31
CHRNB2 P17787 1/20 0.31
NFKB1 P19838 1/20 0.31
MAPK1 P28482 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA4 P43681 1/20 0.31
HSD17B10 Q99714 1/20 0.31
PSIP1 O75475 1/20 0.31
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
APOBEC3A P31941 1/20 0.30
PMP22 Q01453 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5298667 0.91 CHRNA7 (0.38) CHRNA7CYP1A2CYP2C9TP53LMNA
SCHEMBL5944519 0.89 CHRNA7 (0.37) CHRNA7CYP1A2CYP2C9TP53LMNA
Iodide SCHEMBL11575949 0.89 CHRNA7 (0.37) CHRNA7CYP1A2CYP2C9TP53LMNA
Iodide SCHEMBL11574865 0.87 APOBEC3A (0.40) CHRNA7CYP1A2CYP2C9TP53LMNA
SCHEMBL15293602 0.85 CYP1A2 (0.56) CHRNA7CYP1A2CYP2C9TP53LMNA
SCHEMBL9538584 0.85 CHRNA7 (0.35) CHRNA7CYP1A2CYP2C9LMNAMEN1
SCHEMBL14992324 0.75 CYP1A2 (0.38) CYP1A2CYP2C9
SCHEMBL5285109 0.73 NPC1 (0.40) CHRNA7CYP1A2CYP2C9TP53LMNA
SCHEMBL5944444 0.72 NPC1 (0.42) CHRNA7CYP1A2CYP2C9LMNAL3MBTL1
SCHEMBL5298531 0.70 APOBEC3A (0.37) CYP1A2CYP2C9APOBEC3AKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8051549-B2 Method for producing plasma display panel PANASONIC CORPORATION (JP) 2011-11-08 US disclosed
US-20110126398-A1 METHOD FOR PRODUCING PLASMA DISPLAY PANEL PANASONIC CORPORATION (JP) 2011-06-02 US disclosed
EP-2187423-A1 METHOD FOR PRODUCING PLASMA DISPLAY PANEL Panasonic Corporation (JP) 2010-05-19 EP disclosed
US-6916222-B2 Process of making barrier ribs, electrodes, and the like for a plasma panel TOKYO OHKA KOGYO CO., LTD. (JP) 2005-07-12 US disclosed
US-6749994-B2 Photosensitive insulating paste composition and photosensitive film made therefrom TOKYO OHKA KOGYO CO., LTD. (JP) 2004-06-15 US disclosed
US-20020164542-A1 Photosensitive insulating paste composition and photosensitive film made therefrom TOKYO OHKA KOGYO CO., LTD. (JP) 2002-11-07 US disclosed
US-20020163108-A1 Process of producing plasma display panel TOKYO OHKA KOGYO CO., LTD. (JP) 2002-11-07 US disclosed