SCHEMBL8148446

SCHEMBL8148446

CCOC(=O)CCC(C)Cl

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.50
KMT2A Q03164 2/20 0.47
POLB P06746 2/20 0.47
CYP1A2 P05177 1/20 0.47
GAA P10253 2/20 0.46
MGAM O43451 1/20 0.46
SI P14410 1/20 0.46
MGAM2 Q2M2H8 1/20 0.46
ALDH1A1 P00352 5/20 0.43
TRPA1 O75762 1/20 0.43
CYP4F2 P78329 2/20 0.39
CYP4A11 Q02928 2/20 0.39
NR1I2 O75469 1/20 0.38
PGR P06401 1/20 0.38
ADORA3 P0DMS8 1/20 0.38
PTGS2 P35354 1/20 0.38
PDE4D Q08499 1/20 0.38
LMNA P02545 2/20 0.37
HSD17B10 Q99714 2/20 0.37
TSHR P16473 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8150146 0.88 CYP1A2 (0.53) L3MBTL1KMT2APOLBCYP1A2GAA
SCHEMBL5737722 0.84 L3MBTL1 (0.52) L3MBTL1KMT2APOLBCYP1A2GAA
SCHEMBL11360196 0.83 DGKA (0.44) L3MBTL1KMT2APOLBALDH1A1TSHR
SCHEMBL10395011 0.83 L3MBTL1 (0.50) L3MBTL1KMT2APOLBCYP1A2GAA
SCHEMBL103981 0.82 L3MBTL1 (0.53) L3MBTL1KMT2APOLBCYP1A2GAA
SCHEMBL11451286 0.81 CYP1A2 (0.43) L3MBTL1KMT2APOLBCYP1A2GAA
SCHEMBL8154344 0.81 L3MBTL1 (0.49) L3MBTL1KMT2APOLBCYP1A2GAA
SCHEMBL21811588 0.81 TSHR (0.41) L3MBTL1KMT2APOLBGAAALDH1A1
SCHEMBL11361886 0.80 DGKA (0.50) ALDH1A1LMNATSHRMAPTCYP3A4
SCHEMBL985537 0.80 L3MBTL1 (0.52) L3MBTL1KMT2APOLBCYP1A2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11958802-B2 Migration-resistant photopolymerization sensitizer KAWASAKI KASEI CHEMICALS LTD. (JP) 2024-04-16 US disclosed
CN-113166036-B Photopolymerizing sensitizers with migration resistance 川崎化成工业株式会社 2023-10-10 CN disclosed
US-20220106254-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-04-07 US disclosed
CN-113166036-A Photopolymerisable sensitizers having migration resistance 川崎化成工业株式会社 2021-07-23 CN disclosed
WO-2020213442-A1 PHOTOPOLYMERIZABLE COMPOSITION, COATING FILM CONTAINING SAID PHOTOPOLYMERIZABLE COMPOSITION, AND CURING METHOD THEREFOR 川崎化成工業株式会社 2020-10-22 WO disclosed
WO-2020209209-A1 RADICAL PHOTOCURING OXYGEN INHIBITION REDUCER, RADICAL PHOTOPOLYMERIZABLE COMPOSITION CONTAINING RADICAL PHOTOCURING OXYGEN INHIBITION REDUCER, COATING CONTAINING RADICAL PHOTOCURING OXYGEN INHIBITION REDUCER, AND METHOD FOR CURING SAME 川崎化成工業株式会社 2020-10-15 WO disclosed
WO-2020208833-A1 PHOTO-RADICALLY CURABLE OXYGEN-INHIBITION-REDUCING AGENT, PHOTO-RADICALLY CURABLE OXYGEN-INHIBITION-REDUCING AGENT-CONTAINING PHOTO-RADICALLY POLYMERIZABLE COMPOSITION, PHOTO-RADICALLY CURABLE OXYGEN-INHIBITION-REDUCING AGENT-CONTAINING COATING FILM, AND METHOD FOR CURING SAME 川崎化成工業株式会社 2020-10-15 WO disclosed
WO-2020121544-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-06-18 WO disclosed
WO-2020054874-A1 PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-03-19 WO disclosed
WO-2020054116-A1 PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-03-19 WO disclosed
US-6041157-A Environmentally sensitive compositions of matter based on 3H-fluoren-3-ylidenes and process for making same GOETZ FREDERICK JAMES (US) 2000-03-21 US disclosed
EP-0181779-B1 Heterocyclic compounds, their production, and medicaments containing them YAMANOUCHI PHARMA CO LTD (JP) 1994-03-16 EP disclosed
US-5258395-A Slow reacting substance of anaphylaxis antagonists YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1993-11-02 US disclosed
US-5177215-A Heterocyclic compounds and pharmaceutical use thereof YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1993-01-05 US disclosed
US-4908368-A SRS-A antagonist MURASE KIYOSHI (JP) 1990-03-13 US disclosed
US-4855310-A Thiadiazole compounds as antagonists of SRS-A YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1989-08-08 US disclosed
EP-0181779-A1 Heterocyclic compounds, their production, and medicaments containing them YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1986-05-21 EP disclosed
US-4520209-A Process for cyclizing upsilon-chlorocarboxylic acids DEGUSSA AKTIENGESELLSCHAFT (DE) 1985-05-28 US disclosed
US-4254262-A IN THE PRESENCE OF A QUATERNARY AMMONIUM OR PHOSPHONIUM SALT IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1981-03-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11958802-B2 Migration-resistant photopolymerization sensitizer F12, F10, PCNA L3MBTL1 2846/4885KMT2A 1171/4885POLB 195/4885
US-20220106254-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER F12, F10, PCNA L3MBTL1 2846/4885KMT2A 1171/4885POLB 195/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.