SCHEMBL8149128

SCHEMBL8149128

C=CC(=O)OCCOC(=O)C(F)(F)F

nearest known ligand 0.59

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.59
ALDH1A1 P00352 4/20 0.59
TP53 P04637 3/20 0.59
HIF1A Q16665 3/20 0.59
HSD17B10 Q99714 1/20 0.59
CYP3A4 P08684 2/20 0.54
THRB P10828 3/20 0.49
HPGD P15428 1/20 0.48
MAPK1 P28482 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13557336 0.88 TSHR (0.59) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10171087 0.84 TSHR (0.55) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL17445919 0.84 TSHR (0.55) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL18477590 0.82 TSHR (0.53) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL10094784 0.82 TSHR (0.53) TSHRALDH1A1TP53HIF1AHSD17B10
Ethylene SCHEMBL11404296 0.82 ALDH1A1 (0.32) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL30604742 0.82 TSHR (0.84) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1589356 0.82 HTT (0.35) ALDH1A1SMN1; SMN2
SCHEMBL93462 0.82 TSHR (0.84) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL21474659 0.81 TSHR (0.52) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9233945-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-12 US disclosed
US-9233945-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-12 US disclosed
US-20150301451-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-22 US disclosed
US-20150301451-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-22 US disclosed
US-9051247-B2 Salt, photoresist composition, and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-09 US disclosed
US-9051247-B2 Salt, photoresist composition, and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-09 US disclosed
US-8802352-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-08-12 US disclosed
US-8802352-B2 Salt, photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-08-12 US disclosed
US-8765357-B2 Resin and photoresist composition comprising same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-07-01 US disclosed
US-8765357-B2 Resin and photoresist composition comprising same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-07-01 US disclosed
US-5883019-A HYDROLYZED VINYL CARBOXYLATE MONOMERS; BINDER COATING OF POLYVINYL ALCOHOL INSOLUBIIZED WITH POLYMERIC POLYCARBOXYLIC ACID; BABY WIPES MINNESOTA MINING AND MANUFACTURING CO. (US) 1999-03-16 US disclosed
US-5656333-A PROVIDING NONWOVEN WEB OF ORGANIC FIBERS HAVING PENDANT HYDROXYL GROUPS, COATING WITH BINDER PRECURSOR THAT IS A SILANOL MODIFIED, CROSSLINKED, HYDROLYZED VINYL ALCOHOL RESIN, SOLIDIFYING MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-08-12 US disclosed
US-5641563-A Nonwoven articles MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-06-24 US disclosed
EP-0705354-B1 NONWOVEN ARTICLES AND METHODS OF PRODUCING SAME MINNESOTA MINING & MFG (US) 1997-06-11 EP disclosed
EP-0705354-A1 NONWOVEN ARTICLES AND METHODS OF PRODUCING SAME MINNESOTA MINING & MFG (US) 1996-04-10 EP disclosed
WO-1994028223-A1 NONWOVEN ARTICLES AND METHODS OF PRODUCING SAME MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1994-12-08 WO disclosed
US-4921884-A Hydroxy-substituted polymeric shaped hydrogel article MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-05-01 US disclosed
US-4786446-A INTRAOCULAR LENSES, CONTACT LENSES, CORNEAL TRANSPLANTS OR IMPLANTS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-11-22 US disclosed
US-4673539-A MOLDING POLYMER OF ETHYLENICALLY UNSATURATED MONOMER HAVING TRIHALOACETOXY SUBSTITUENT MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1987-06-16 US disclosed
US-4054722-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-18 US disclosed