Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 7/20 | 0.37 |
| ▸ | SCN1A | P35498 | 2/20 | 0.35 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.35 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 3/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4622177 | 0.93 | TSHR (0.38) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL3861878 | 0.84 | TDP1 (0.40) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL29695333 | 0.84 | THRB (0.42) | TDP1TSHRSCN1ASCN2ASCN3A | |
| SCHEMBL3319113 | 0.84 | THRB (0.42) | TDP1TSHRSCN1ASCN2ASCN3A | |
| SCHEMBL4882782 | 0.82 | TSHR (0.44) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL28650350 | 0.82 | TSHR (0.38) | TDP1TSHRSCN1ASCN2ASCN3A | |
| SCHEMBL28197293 | 0.81 | TSHR (0.50) | TDP1POLBTSHRALDH1A1THRB | |
| SCHEMBL11018360 | 0.81 | TSHR (0.43) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL472203 | 0.80 | POLB (0.38) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL14889264 | 0.80 | ALDH1A1 (0.34) | TDP1POLBAPEX1HTTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240043706-A1 | ACTIVE ENERGY RAY-CURABLE INKJET INK FOR BEVERAGE CONTAINER, ACTIVE ENERGY RAY-CURABLE INKJET INK SET, AND IMAGE RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2024-02-08 | — | — | US | disclosed |
| US-20230133905-A1 | CURABLE COMPOSITION, CURED FILM, METHOD OF PRODUCING CURED FILM, ELEMENT, AND DISPLAY DEVICE | AGC Inc. (JP) | 2023-05-04 | — | — | US | disclosed |
| CN-115776997-A | Curable composition, cured film, method for producing cured film, element, and display device | ＡＧＣ株式会社 | 2023-03-10 | — | — | CN | disclosed |
| CN-115551960-A | Ink set, image recording method, and recorded matter | 富士胶片株式会社 | 2022-12-30 | — | — | CN | disclosed |
| US-20220411553-A1 | BLACK PARTICLES, BLACK COATING MATERIAL, COATING FILM, AND BLACK MATRIX FOR COLOR FILTERS | SEKISUI CHEMICAL CO., LTD. (JP) | 2022-12-29 | — | — | US | disclosed |
| CN-115403960-A | Inkjet ink and inkjet recording method | 富士胶片株式会社 | 2022-11-29 | — | — | CN | disclosed |
| US-11331940-B2 | Ink jet recording method and method for manufacturing laminated printed matter | FUJIFILM CORPORATION (JP) | 2022-05-17 | — | — | US | disclosed |
| EP-3995312-A1 | ACTINIC RAY-CURABLE INK COMPOSITION AND PRODUCTION METHOD FOR INORGANIC FIRED BODY | FUJIFILM Corporation (JP) | 2022-05-11 | — | — | EP | disclosed |
| WO-2022091883-A1 | IMAGE RECORDING METHOD | 富士フイルム株式会社 | 2022-05-05 | — | — | WO | disclosed |
| WO-2022070593-A1 | INK SET, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | 富士フイルム株式会社 | 2022-04-07 | — | — | WO | disclosed |
| US-20040248030-A1 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-12-09 | — | — | US | disclosed |
| CN-1543591-A | Photosensitive resin composition for photoresist | 东进瑟弥侃株式会社 | 2004-11-03 | — | — | CN | disclosed |
| EP-1457527-A1 | CURABLE COMPOSITIONS, SEALING MATERIAL, AND ADHESIVE | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-09-15 | — | — | EP | disclosed |
| US-6749994-B2 | Photosensitive insulating paste composition and photosensitive film made therefrom | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-15 | — | — | US | disclosed |
| WO-2003036388-A1 | PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-05-01 | — | — | WO | disclosed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | disclosed |
| CN-1384138-A | Photosensitive insulated glue composition and photosensitive film of the glue | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2002-12-11 | — | — | CN | disclosed |
| CN-1384521-A | Manufacture of plasma display plate | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2002-12-11 | — | — | CN | disclosed |
| US-20020164542-A1 | Photosensitive insulating paste composition and photosensitive film made therefrom | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-11-07 | — | — | US | disclosed |
| US-20020163108-A1 | Process of producing plasma display panel | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-11-07 | — | — | US | disclosed |