SCHEMBL8152736

SCHEMBL8152736

CCCC(C(C)=O)C(=O)[O-].CCCC(C(C)=O)C(=O)[O-].CCCC(C(C)=O)C(=O)[O-].CCCC(C(C)=O)C(=O)[O-].[Ti+4]

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFKB1 P19838 3/20 0.52
CYP3A4 P08684 2/20 0.52
TSHR P16473 2/20 0.52
NPSR1 Q6W5P4 2/20 0.52
CA1 P00915 3/20 0.40
CA2 P00918 4/20 0.39
HDAC1 Q13547 3/20 0.37
HDAC2 Q92769 3/20 0.37
CHRM1 P11229 1/20 0.37
AKR1A1 P14550 1/20 0.37
CHRM3 P20309 1/20 0.37
HTR2A P28223 1/20 0.37
HTR2C P28335 1/20 0.37
ADRA1A P35348 1/20 0.37
HRH1 P35367 1/20 0.37
DRD3 P35462 1/20 0.37
SLC6A3 Q01959 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
HDAC8 Q9BY41 3/20 0.35
FFAR3 O14843 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17106132 0.95 NFKB1 (0.52) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL2139314 0.95 NFKB1 (0.52) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL8680197 0.95 NFKB1 (0.52) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL207912 0.95 NFKB1 (0.52) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL6152599 0.89 CYP3A4 (0.46) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL11073494 0.89 TSHR (0.46) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL23093495 0.86 CA2 (0.50) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL16085926 0.82 CYP3A4 (0.41) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL15377550 0.82 CYP3A4 (0.41) NFKB1CYP3A4TSHRNPSR1CA1
SCHEMBL8150895 0.82 TSHR (0.41) NFKB1CYP3A4TSHRNPSR1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6147169-A LOW TEMPERATURE CURING MIXTURE OF REACTIVE BASE RESIN AND A CLATHRATE COMPRISING A TETRAKISPHENOL HOSTING A CURING AGENT OR CURING CATALYST; STORAGE STABILITY, CORROSION RESISTANCE, ADHESION KANSAI PAINT CO., LTD. (JP) 2000-11-14 US disclosed