Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NSD2 | O96028 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | EGFR | P00533 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1135092 | 0.86 | MEN1 (0.30) | LMNA | |
| SCHEMBL8156144 | 0.83 | NR3C1 (0.40) | L3MBTL1 | |
| SCHEMBL7942039 | 0.83 | NSD2 (0.31) | NSD2ALDH1A1EGFRLMNAMAPT | |
| SCHEMBL8156626 | 0.81 | RAB9A (0.30) | PDK2 | |
| SCHEMBL7934602 | 0.81 | NSD2 (0.33) | NSD2ALDH1A1EGFRLMNAMAPT | |
| Hydrochloric Acid SCHEMBL17743573 | 0.79 | NSD2 (0.32) | NSD2ALDH1A1EGFRLMNAMAPT | |
| SCHEMBL1135070 | 0.76 | — | — | |
| SCHEMBL8154216 | 0.75 | GAA (0.36) | ALDH1A1LMNAMAPTMAPK1TDP1 | |
| SCHEMBL8156186 | 0.74 | TTR (0.30) | — | |
| SCHEMBL6562418 | 0.73 | POLB (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6121396-A | USING A METALLOCENE HAVING A SUBSTITUTED FLUORENYL GROUP, AND A COMPOUND REACTING WITH THE METALLOCENE TO FORM A CATIONIC METALLOCENE; HIGH- AND NARROW MOLECULAR WEIGHT; NARROW COMPOSITION DISTRIBUTION; PROCESS TEMPERATURE OF >120 C. | TOSOH CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |