SCHEMBL81579

SCHEMBL81579

CCNc1ccc2c(c1)Sc1cc(NCC)ccc1N2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SNCA P37840 7/20 0.46
NOX1 Q9Y5S8 6/20 0.40
MAPT P10636 6/20 0.40
GAA P10253 5/20 0.40
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
TDP1 Q9NUW8 3/20 0.40
LMNA P02545 3/20 0.40
MAPK1 P28482 2/20 0.40
HTT P42858 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
ALOX15 P16050 2/20 0.40
ALDH1A1 P00352 1/20 0.40
TSHR P16473 1/20 0.40
HSD17B10 Q99714 1/20 0.40
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
ALOX12 P18054 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1925368 0.79 SNCA (0.50) SNCANOX1MAPTGAAMEN1
SCHEMBL12471742 0.77 CA12 (0.44) SNCANOX1MAPTGAAMEN1
SCHEMBL25124378 0.77 EPHX2 (0.58) KMT2ALMNAHTTALDH1A1MAOA
SCHEMBL20398351 0.76 TDP1 (0.53) SNCANOX1MAPTGAAMEN1
SCHEMBL3890165 0.76 HTT (0.50) NOX1HTTALDH1A1CYP1A2MAOA
Hydrochloric Acid SCHEMBL20398345 0.75 TDP1 (0.52) SNCANOX1MAPTGAAMEN1
SCHEMBL22562767 0.75 SNCA (0.46) SNCANOX1MAPTGAAMEN1
SCHEMBL21683233 0.74 ALOX5 (0.38) MAPTMEN1KMT2ALMNAMAPK1
SCHEMBL38658914 0.74 ALOX5 (0.38) MAPTMEN1KMT2ALMNAMAPK1
SCHEMBL20398354 0.74 SNCA (0.46) SNCANOX1MAPTGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705007-B1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORP (JP) 2012-06-06 EP disclosed
US-8127675-B2 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2012-03-06 US disclosed
US-7662540-B2 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2010-02-16 US disclosed
US-20100005989-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORPORATION 2010-01-14 US disclosed
US-20080268374-A1 Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-7402374-B2 Method for colored image formation FUJIFILM CORPORATION (JP) 2008-07-22 US disclosed
US-20080118867-A1 Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process ASAHI KASEI E-MATERIALS CORPORATION (JP) 2008-05-22 US disclosed
US-20080113302-A1 Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-05-15 US disclosed
US-20080088813-A1 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2008-04-17 US disclosed
EP-1602480-B1 Method for colored image formation FUJIFILM CORP (JP) 2007-12-12 EP disclosed
EP-1602480-A1 Method for colored image formation Fuji Photo Film Co., Ltd. (JP) 2005-12-07 EP disclosed
WO-2005109098-A1 PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-11-17 WO disclosed
WO-2005091078-A1 PATTERN FORMING PROCESS AND PATTERN FUJI PHOTO FILM CO., LTD. (JP) 2005-09-29 WO disclosed
WO-2005083522-A1 PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-09-09 WO disclosed
WO-2005078776-A1 PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-08-25 WO disclosed
US-20050170282-A1 Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO., LTD. 2005-08-04 US disclosed
EP-1557262-A2 Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO., LTD. (JP) 2005-07-27 EP disclosed
US-20030232193-A1 Dry film resist and printed circuit board producing method FUJI PHOTO FILM CO., LTD. (JP) 2003-12-18 US disclosed
US-5030548-A Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists FUJI PHOTO FILM CO., LTD. (JP) 1991-07-09 US disclosed
US-4271251-A LEUCO DYE, PHOTOOXIDIZER, 2,4-DIHYDROXY-BENZALDOXIME FUJI PHOTO FILM CO., LTD. (JP) 1981-06-02 US disclosed