Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 6/20 | 0.83 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.83 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.83 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.83 |
| ▸ | MAPT | P10636 | 4/20 | 0.83 |
| ▸ | LMNA | P02545 | 1/20 | 0.83 |
| ▸ | PDE5A | O76074 | 6/20 | 0.78 |
| ▸ | EGFR | P00533 | 4/20 | 0.77 |
| ▸ | ERBB2 | P04626 | 3/20 | 0.77 |
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.76 |
| ▸ | ATM | Q13315 | 4/20 | 0.76 |
| ▸ | RAB9A | P51151 | 1/20 | 0.76 |
| ▸ | GLA | P06280 | 3/20 | 0.74 |
| ▸ | GAA | P10253 | 3/20 | 0.74 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.74 |
| ▸ | POLB | P06746 | 1/20 | 0.74 |
| ▸ | CDC42 | P60953 | 1/20 | 0.74 |
| ▸ | USP2 | O75604 | 1/20 | 0.70 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.70 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.70 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10362296 | 0.97 | EGFR (0.81) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL15301136 | 0.97 | KDM4E (0.88) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL9514571 | 0.94 | MEN1 (0.78) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL15301042 | 0.94 | MEN1 (0.83) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL11210797 | 0.92 | EGFR (0.74) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL11205361 | 0.92 | EGFR (0.74) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL15301347 | 0.92 | MEN1 (0.82) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL9628993 | 0.91 | MEN1 (0.78) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL10654063 | 0.91 | MEN1 (0.91) | MEN1KMT2AKDM4EALDH1A1MAPT | |
| SCHEMBL16740584 | 0.91 | KDM4E (0.78) | MEN1KMT2AKDM4EALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115421355-A | Photosensitive resin composition for dual-wavelength exposure | 保定乐凯新材料股份有限公司 | 2022-12-02 | — | — | CN | claimed |
| EP-0026088-B1 | PHOTORESIST COMPOSITIONS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-11-23 | — | — | EP | claimed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | claimed |
| EP-0026088-A2 | Photoresist compositions | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-04-01 | — | — | EP | claimed |
| WO-2026100065-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | 株式会社レゾナック | 2026-05-15 | — | — | WO | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| CN-111527450-B | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-08-08 | — | — | CN | disclosed |
| CN-115421355-A | Photosensitive resin composition for dual-wavelength exposure | 保定乐凯新材料股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| WO-2022186389-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | 旭化成株式会社 | 2022-09-09 | — | — | WO | disclosed |
| CN-108375874-B | Photosensitive resin composition, photosensitive resin laminate, substrate having resist pattern formed thereon, and method for producing circuit board | 旭化成株式会社 | 2021-10-22 | — | — | CN | disclosed |
| CN-111527450-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2020-08-11 | — | — | CN | disclosed |
| CN-104781730-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 日立化成株式会社 | 2020-03-06 | — | — | CN | disclosed |
| EP-0212450-A1 | Solid scintillator counting compositions | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-03-04 | — | — | EP | disclosed |
| EP-0026088-B1 | PHOTORESIST COMPOSITIONS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-11-23 | — | — | EP | disclosed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | disclosed |
| EP-0026088-A2 | Photoresist compositions | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-04-01 | — | — | EP | disclosed |
| US-4127499-A | POLYMERIC PARTICLES, HYDROPHOBIC FLUOR | EASTMAN KODAK COMPANY (US) | 1978-11-28 | — | — | US | disclosed |
| US-4033769-A | Persistent photoconductive compositions | XEROX CORPORATION (US) | 1977-07-05 | — | — | US | disclosed |
| US-3961954-A | Acid sensitized charge transfer complexes and cyclic electrostatographic imaging | XEROX CORPORATION (US) | 1976-06-08 | — | — | US | disclosed |
| US-3932025-A | Imaging system | XEROX CORPORATION (US) | 1976-01-13 | — | — | US | disclosed |