SCHEMBL819098

SCHEMBL819098

CC(=O)C1C2C=CC(C2)C1C(=O)O

nearest known ligand 0.62

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
POLB P06746 4/20 0.62
TDP1 Q9NUW8 4/20 0.62
APEX1 P27695 1/20 0.62
ALDH1A1 P00352 2/20 0.51
SMN1; SMN2 Q16637 2/20 0.47
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
KDM4E B2RXH2 1/20 0.44
NPSR1 Q6W5P4 1/20 0.42
TAAR1 Q96RJ0 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17365287 1.00 POLB (0.62) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL22062079 1.00 POLB (0.62) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL10195112 0.91 TDP1 (0.46) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL19325256 0.91 TDP1 (0.46) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL24120969 0.91 TDP1 (0.46) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL23612575 0.91 TDP1 (0.46) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL14495731 0.91 TDP1 (0.46) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL10016076 0.91 TDP1 (0.46) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL18053329 0.88 POLB (0.81) POLBTDP1APEX1ALDH1A1SMN1; SMN2
SCHEMBL819841 0.88 POLB (0.81) POLBTDP1APEX1ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240018298-A1 OLEFINIC COMPOSITIONS COMPRISING HYDROCARBON RESINS ExxonMobil Product Solutions Company 2024-01-18 US disclosed
US-10676570-B2 Photosensitive resin composition, black pixel defining layer using the same and display device SAMSUNG SDI CO., LTD. (KR) 2020-06-09 US disclosed
US-20180118887-A1 PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PRECURSOR COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180118887-A1 PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PRECURSOR COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20170255100-A1 DRY FILM STRUCTURE FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2017-09-07 US disclosed
US-20170255100-A1 DRY FILM STRUCTURE FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2017-09-07 US disclosed
US-9519216-B2 Positive photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2016-12-13 US disclosed
US-9519216-B2 Positive photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2016-12-13 US disclosed
US-20160311970-A1 INSERTION POLYNORBORNENE-BASED THERMOSET RESINS CLAVERIE, Jérôme (CA) 2016-10-27 US disclosed
US-20160237116-A1 SITE-SPECIFIC CHEMOENZYMATIC PROTEIN MODIFICATIONS NOVARTIS AG 2016-08-18 US disclosed
US-20070254243-A1 METHOD FOR MANUFACTURING PHOTOSENSITIVE RESIN COMPOSITION AND RELIEF PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2007-11-01 US disclosed
US-20070172753-A1 Photosensitive resin composition and manufacturing method of semiconductor device using the same FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed
US-20070172753-A1 Photosensitive resin composition and manufacturing method of semiconductor device using the same FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed
US-7238455-B2 Mixture of alkali soluble resin, quinonediazide compound and alcohol SUMITOMO BAKELITE COMPANY, LTD. (JP) 2007-07-03 US disclosed
US-7238455-B2 Mixture of alkali soluble resin, quinonediazide compound and alcohol SUMITOMO BAKELITE COMPANY, LTD. (JP) 2007-07-03 US disclosed
US-7220520-B2 Photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-05-22 US disclosed
US-7220520-B2 Photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-05-22 US disclosed
US-20070099111-A1 Novel positive photosensitive polybenzoxazole precursor compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-05-03 US disclosed
US-20070099111-A1 Novel positive photosensitive polybenzoxazole precursor compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-05-03 US disclosed
WO-2007022124-A2 NOVEL POSITIVE PHOTOSENSITIVE POLYBENZOXAZOLE PRECURSOR COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A, INC. (US) 2007-02-22 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160237116-A1 SITE-SPECIFIC CHEMOENZYMATIC PROTEIN MODIFICATIONS PTMS, TGM3, TGM1 POLB 3483/4885TDP1 2938/4885APEX1 752/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.