SCHEMBL8192566

SCHEMBL8192566

CCCCCCN(CC)OC

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 9/20 0.46
TSHR P16473 1/20 0.40
THRB P10828 1/20 0.40
MGLL Q99685 1/20 0.38
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA9 Q16790 1/20 0.37
GBA1 P04062 1/20 0.34
PLA2G1B P04054 1/20 0.34
PLA2G2A P14555 1/20 0.34
KCNH2 Q12809 1/20 0.33
S1PR2 O95136 1/20 0.32
S1PR1 P21453 1/20 0.32
S1PR3 Q99500 1/20 0.32
S1PR5 Q9H228 1/20 0.32
ADH1C P00326 1/20 0.32
ADH1A P07327 1/20 0.32
ADH4 P08319 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14621559 1.00 DNM1 (0.46) DNM1TSHRTHRBMGLLCA12
SCHEMBL24728638 0.90 DNM1 (0.50) DNM1TSHRTHRBMGLLCA12
Nitric Acid SCHEMBL9009585 0.84 ALDH1A1 (0.39) DNM1MGLLCA12CA1CA2
Pentane SCHEMBL27964096 0.78 TSHR (0.44) TSHRTHRB
SCHEMBL27337846 0.78 TSHR (0.35) DNM1TSHRTHRBCA12CA1
SCHEMBL28122404 0.78 DNM1 (0.44) DNM1TSHRTHRBMGLLCA12
SCHEMBL28035434 0.78 DNM1 (0.44) DNM1TSHRTHRBMGLLCA12
SCHEMBL28121818 0.78 DNM1 (0.44) DNM1TSHRTHRBMGLLCA12
SCHEMBL11648978 0.78 DNM1 (0.44) DNM1TSHRTHRBMGLLCA12
SCHEMBL28126402 0.76 DNM1 (0.42) DNM1TSHRTHRBMGLLCA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4076537-A Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US claimed
US-6106994-A ESTERIFYING A POLYPHENOL COMPOUND AND NAPHTHOQUINONE-1,2-DIAZIDESULFONYL HALIDE IN THE PRESENCE OF FOR EXAMPLE MONOMETHYLDICYCLOHEXYLAMINE, AND POSITIVE PHOTOSENSITIVE COMPOSITION CONTAINS RESULTANT ESTER TOKYO OHKA KOGYO CO., LTD. (JP) 2000-08-22 US disclosed
US-4076537-A Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US disclosed
US-4076530-A Dry photographic copying method for producing Te images FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US disclosed
US-4062685-A ORGANO-TELLURIUM COMPOUND FUJI PHOTO FILM CO., LTD. (JA) 1977-12-13 US disclosed