SCHEMBL820084

SCHEMBL820084

O=C(O)C=Cc1ccccc1[N+](=O)[O-]

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 1.00
MAOB P27338 1/20 0.73
MEN1 O00255 3/20 0.69
KMT2A Q03164 3/20 0.69
RAB9A P51151 3/20 0.68
NPC1 O15118 2/20 0.68
SMN1; SMN2 Q16637 2/20 0.68
NFKB1 P19838 2/20 0.68
KDM4E B2RXH2 1/20 0.68
NFKB2 Q00653 1/20 0.68
RELA Q04206 1/20 0.68
ALDH1A1 P00352 8/20 0.61
LMNA P02545 3/20 0.61
ATM Q13315 2/20 0.61
HSP90AA1 P07900 1/20 0.61
BACE1 P56817 1/20 0.60
AR P10275 1/20 0.57
CA1 P00915 1/20 0.55
CA2 P00918 1/20 0.55
CA4 P22748 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10673342 1.00 MAPT (1.00) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL42323 1.00 MAPT (1.00) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL3295983 1.00 MAPT (1.00) MAPTMAOBMEN1KMT2ARAB9A
Hydrochloric Acid SCHEMBL27758234 0.98 MAPT (0.97) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL1232668 0.88 MAPT (0.79) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL1232666 0.88 MAPT (0.79) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL4185536 0.87 MAPT (0.77) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL4185541 0.87 MAPT (0.77) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL2184440 0.87 MAPT (0.77) MAPTMAOBMEN1KMT2ARAB9A
SCHEMBL28977485 0.86 MAPT (0.76) MAPTMAOBMEN1KMT2ARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 396 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118086841-B TiSiNiYN coating for enhancing high-temperature wear resistance 纳狮新材料有限公司杭州分公司 2025-02-07 CN claimed
CN-118086841-A TiSiNiYN coating for enhancing high-temperature wear resistance 纳狮新材料有限公司杭州分公司 2024-05-28 CN claimed
CN-114381156-B Metal oxide dispersion composition, method for producing same, film composition containing same, optical film, and optical element 凯斯科技股份有限公司 2024-03-12 CN claimed
WO-2023027630-A9 A FLOW REACTOR, METHODS OF FABRICATION AND REACTIONS THEREOF NATIONAL UNIVERSITY OF SINGAPORE (SG) 2023-07-27 WO claimed
WO-2023027630-A2 A FLOW REACTOR, METHODS OF FABRICATION AND REACTIONS THEREOF NATIONAL UNIVERSITY OF SINGAPORE (SG) 2023-03-02 WO claimed
CN-112831206-B Inorganic oxide dispersion with controllable water content and preparation method thereof 凯斯科技股份有限公司 2022-12-30 CN claimed
CN-114656818-A Metal oxide dispersion 凯斯科技股份有限公司 2022-06-24 CN claimed
CN-114381156-A Metal oxide dispersion composition, method for producing same, film composition containing same, optical film, and optical element 凯斯科技股份有限公司 2022-04-22 CN claimed
CN-113024573-A Epodophyllotoxin derivative, preparation method and application thereof in preparation of antitumor drugs 江苏百奥信康医药科技有限公司 2021-06-25 CN claimed
CN-108863899-B Synthetic method and application of indoline-2-ketone compound 中国科学院兰州化学物理研究所 2021-05-28 CN claimed
US-20060199039-A1 Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-09-07 US claimed
US-7033424-B2 Phase change inks XEROX CORPORATION (US) 2006-04-25 US claimed
US-20060021546-A1 Processes for preparing phase change inks XEROX CORPORATION 2006-02-02 US claimed
US-20060020141-A1 Metallized dye XEROX CORPORATION 2006-01-26 US claimed
US-20060016369-A1 PHASE CHANGE INKS XEROX CORPORATION 2006-01-26 US claimed
US-20060000778-A1 high-performance membrane designed for the selective removal of a polar fluid (water) from less polar fluids (organic solvents), by a pervaporation using a composite membrane contaiing ultrafiltration membrane as support ( e.g. cellulose acetate) and a crosslinked copolymer of anionic, cationic monomers MCMASTER UNIVERSITY (CA) 2006-01-05 US claimed
US-6946025-B2 Process for preparing tetra-amide compounds XEROX CORPORATION (US) 2005-09-20 US claimed
US-20050161666-A1 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-07-28 US claimed
US-20050090690-A1 Process for preparing tetra-amide compounds XEROX CORPORATION 2005-04-28 US claimed
EP-1526584-A2 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same Samsung Electronics Co., Ltd (KR) 2005-04-27 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060020141-A1 Metallized dye CDYL, CDY1; CDY1B, CDYL2 MAPT 4074/4885MAOB 62/4885MEN1 685/4885
US-20050090690-A1 Process for preparing tetra-amide compounds TAF9, TAF5, TAF1 MAPT 539/4885MAOB 1285/4885MEN1 1466/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.