Anisole

Anisole

SCHEMBL8206891

COc1ccccc1.COc1ccccc1.O=C1CCCCC1.O=C1CCCCC1

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA4 P22748 1/20 0.58
▸ LTA4H P09960 2/20 0.50
▸ ALDH1A1 P00352 3/20 0.46
▸ TRIM24 O15164 2/20 0.46
▸ TRIM33 Q9UPN9 2/20 0.46
▸ CES2 O00748 1/20 0.42
▸ CES1 P23141 1/20 0.42
▸ MEN1 O00255 2/20 0.42
▸ KMT2A Q03164 2/20 0.42
▸ SIGMAR1 Q99720 1/20 0.42
▸ BACE1 P56817 1/20 0.42
▸ EGFR P00533 1/20 0.41
▸ LMNA P02545 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ HTT P42858 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ POLB P06746 1/20 0.41
▸ TRPA1 O75762 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anisole SCHEMBL2891523 1.00 CA4 (0.58) CA4LTA4HALDH1A1TRIM24TRIM33
Anisole SCHEMBL27660009 1.00 CA4 (0.58) CA4LTA4HALDH1A1TRIM24TRIM33
Anisole SCHEMBL28247668 0.91 CA4 (0.64) CA4LTA4HALDH1A1CES2CES1
Anisole SCHEMBL28183278 0.84 CA4 (0.82) CA4LTA4HALDH1A1CES2CES1
Cyclohexanone SCHEMBL14842383 0.79 TRIM24 (0.46) LTA4HALDH1A1TRIM24TRIM33MEN1
Anisole SCHEMBL28179768 0.79 — —
Cyclohexanone SCHEMBL2678292 0.78 ALDH1A1 (0.44) LTA4HALDH1A1TRIM24TRIM33MEN1
Anisole SCHEMBL8472521 0.76 CA4 (1.00) CA4LTA4HALDH1A1CES2CES1
Anisole SCHEMBL20328417 0.76 — —
Cyclohexanone SCHEMBL4564591 0.76 ALDH1A1 (0.79) ALDH1A1TRIM24TRIM33MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6025117-A USING POLYSILANE COPOLYMER OR DENDRIMER FILM PATTERN AS MASK FOR ETCHING INSULATING OR CONDUCTING LAYER ON SUBSTRATE KABUSHIKI KAISHA TOSHIBA (JP) 2000-02-15 — — US disclosed
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