SCHEMBL821036

SCHEMBL821036

Cc1cccc2cc3ccccc3[c]c12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 6/20 0.40
CYP2A6 P11509 5/20 0.40
ALDH1A1 P00352 3/20 0.40
HPGD P15428 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TSHR P16473 1/20 0.35
ACHE P22303 1/20 0.35
MAOB P27338 3/20 0.33
MAOA P21397 2/20 0.33
BRD4 O60885 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
NQO2 P16083 1/20 0.30
ADORA3 P0DMS8 1/20 0.30
ADORA2A P29274 1/20 0.30
ADORA1 P30542 1/20 0.30
ATM Q13315 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA7 P43166 1/20 0.30
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL819236 0.83 CYP1A2 (0.48) CYP1A2CYP2A6ALDH1A1HPGDHSD17B10
SCHEMBL819774 0.83 CYP1A2 (0.48) CYP1A2CYP2A6ALDH1A1HPGDHSD17B10
SCHEMBL820739 0.81 CYP1A2 (0.44) CYP1A2CYP2A6ALDH1A1HPGDHSD17B10
SCHEMBL819614 0.81 CYP1A2 (0.47) CYP1A2CYP2A6ALDH1A1HPGDHSD17B10
SCHEMBL2258881 0.79 MAPT (0.44) ALDH1A1TSHRTDP1
SCHEMBL1538553 0.78 CYP2A6 (0.37) CYP2A6ALDH1A1HPGDACHEMAOB
SCHEMBL21385219 0.76 CYP1A2 (0.31) CYP1A2CYP2A6
SCHEMBL2251306 0.76 ALDH1A1 (0.40) ALDH1A1HPGDHSD17B10TSHRTDP1
SCHEMBL5749029 0.76 CYP2A6 (0.50) CYP1A2CYP2A6ALDH1A1HPGDHSD17B10
SCHEMBL5748901 0.76 GABRA1 (0.36) CYP1A2CYP2A6ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103091986-B Positive-type photosensitive resin composition, cured film and forming method thereof, liquid crystal display device and organic electroluminescence display device and method of manufacturing same 富士胶片株式会社 2018-05-18 CN disclosed
US-8431663-B2 Polymer and method for producing same TOKYO INSTITUTE OF TECHNOLOGY (JP) 2013-04-30 US disclosed
US-8389656-B2 Copolymer and method for producing same TOKYO INSTITUTE OF TECHNOLOGY (JP) 2013-03-05 US disclosed
US-8247510-B2 Copolymer and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-21 US disclosed
US-8188202-B2 Making polymers based on monomer 9,9-Diallylfluorene; diallyl groups form cyclohexane ring upon polymerization; superior heat resistance; use of diimine-based nickel complex catalyst, organoaluminum, and boron compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-29 US disclosed
US-20110288250-A1 Copolymer and Production Process Thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-24 US disclosed
US-8044159-B2 Homopolymer and copolymer, and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-10-25 US disclosed
US-20110245441-A1 POLYMER AND METHOD FOR PRODUCING SAME TOKYO INSTITUTE OF TECHNOLOGY (JP) 2011-10-06 US disclosed
US-20110245440-A1 COPOLYMER AND METHOD FOR PRODUCING SAME TOKYO INSTITUTE OF TECHNOLOGY (JP) 2011-10-06 US disclosed
US-7964691-B2 5,5-diallyl-2,2-dimethyl-1,3-dioxane as monomer units; polymerization catalysts; heat resistance SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-06-21 US disclosed
US-20090171054-A1 HOMOPOLYMER AND COPOLYMER, AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-02 US disclosed
US-20080234450-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-25 US disclosed
US-20080221287-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-11 US disclosed
US-20080221288-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-11 US disclosed
US-20080221286-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-11 US disclosed
US-20080214755-A1 OLEFIN-DIENE COPOLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-04 US disclosed
US-20080214754-A1 DIENE POLYMER AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-04 US disclosed
WO-2007023618-A1 HOMOPOLYMER AND COPOLYMER, AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-03-01 WO disclosed
US-20060293503-A1 Polyaminopyridines and method for producing same SUMITOMO SEIKA CHEMICALS CO., LTD (JP) 2006-12-28 US disclosed
EP-1669390-A1 POLYAMINOPYRIDINES AND METHOD FOR PRODUCING SAME SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2006-06-14 EP disclosed