SCHEMBL8216176

SCHEMBL8216176

C[Si](Cl)(Cl)c1cccc2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 6/20 0.44
ALDH1A1 P00352 6/20 0.44
CYP1A2 P05177 6/20 0.44
HSD17B10 Q99714 4/20 0.42
TSHR P16473 3/20 0.42
TDP1 Q9NUW8 1/20 0.42
CYP2C19 P33261 2/20 0.41
CYP2D6 P10635 1/20 0.41
HPGD P15428 2/20 0.39
CYP3A4 P08684 1/20 0.39
KEAP1 Q14145 1/20 0.39
HPRT1 P00492 1/20 0.39
PAX8 Q06710 1/20 0.37
ALOX15 P16050 1/20 0.36
HIF1A Q16665 1/20 0.36
CYP1B1 Q16678 1/20 0.36
THRB P10828 1/20 0.36
CYP2C9 P11712 1/20 0.35
SIGMAR1 Q99720 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15848330 0.88 HPRT1 (0.54) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL10319492 0.86 CYP2A6 (0.44) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL17966499 0.86 CYP2A6 (0.44) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL2932475 0.81 CYP2A6 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL14666536 0.81 ALDH1A1 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL30190041 0.81 CYP2A6 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL14600076 0.81 ALDH1A1 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL275454 0.81 ALDH1A1 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL1131122 0.81 CYP2A6 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR
SCHEMBL5048148 0.81 CYP2A6 (0.48) CYP2A6ALDH1A1CYP1A2HSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3253770-B1 METHOD OF PRODUCING ORGANOHALOSILANES DOW SILICONES CORP (US) 2020-09-02 EP disclosed
EP-3253771-B1 METHOD OF PRODUCING ORGANOHALOSILANES DOW SILICONES CORP (US) 2020-08-12 EP disclosed
US-10183958-B2 Method of producing organohalosilanes DOW SILICONES CORPORATION (US) 2019-01-22 US disclosed
US-20180105542-A1 Method Of Producing Organohalosilanes DOW SILICONES CORPORATION 2018-04-19 US disclosed
US-9908903-B2 Method of producing organohalosilanes DOW CORNING CORPORATION (US) 2018-03-06 US disclosed
US-20170369514-A1 Method Of Producing Organohalosilanes DOW SILICONES CORPORATION 2017-12-28 US disclosed
CN-103515457-B The manufacture method and photocell of base material with antireflection film 日挥触媒化成株式会社 2017-08-25 CN disclosed
WO-2016126804-A1 METHOD OF PRODUCING ORGANOHALOSILANES DOW CORNING CORPORATION (US) 2016-08-11 WO disclosed
WO-2016126808-A1 METHOD OF PRODUCING ORGANOHALOSILANES DOW CORNING CORPORATION (US) 2016-08-11 WO disclosed
US-9260458-B2 Method of producing an organic silicon compound DOW CORNING CORPORATION (US) 2016-02-16 US disclosed
EP-2797855-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND Dow Corning Toray Co., Ltd. (JP) 2014-11-05 EP disclosed
CN-103946185-A Process for producing organosilicon compound DOW CORNING TORAY CO LTD 2014-07-23 CN disclosed
WO-2014104390-A2 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE DOW CORNING TORAY CO., LTD. (JP) 2014-07-03 WO disclosed
WO-2014104388-A2 CURABLE SILICONE COMPOSITION, CURED PRODUCT THEREOF, AND OPTICAL SEMICONDUCTOR DEVICE DOW CORNING TORAY CO., LTD. (JP) 2014-07-03 WO disclosed
CN-103515457-A Method for manufacturing substrate with anti-reflection film and photovoltaic cell JGC CATALYSTS & CHEMICALS LTD 2014-01-15 CN disclosed
WO-2013100166-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND DOW CORNING TORAY CO., LTD. (JP) 2013-07-04 WO disclosed
US-6025117-A USING POLYSILANE COPOLYMER OR DENDRIMER FILM PATTERN AS MASK FOR ETCHING INSULATING OR CONDUCTING LAYER ON SUBSTRATE KABUSHIKI KAISHA TOSHIBA (JP) 2000-02-15 US disclosed
EP-0617044-B1 Process for preparing cyclopentadienyl group-containing silicon compound or cyclopentadienyl group-containing germanium compound MITSUI CHEMICALS INC (JP) 1999-01-20 EP disclosed
US-5360921-A REACTING LITHIUM, SODIUM OR POTASSIUM SALT OF A CYCLOPENTADIENE DERIVATIVE WITH A SILICON OR GERMANIUM HALIDE COMPOUND IN THE PRESENCE OF A CYANIDE OR A THIOCYANATE MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1994-11-01 US disclosed
EP-0617044-A2 Process for preparing cyclopentadienyl group-containing silicon compound or cyclopentadienyl group-containing germanium compound MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1994-09-28 EP disclosed