Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ACHE | P22303 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12825596 | 0.94 | ACHE (0.36) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL7421898 | 0.87 | TSHR (0.47) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL12815116 | 0.80 | ACHE (0.39) | TSHRACHEALDH1A1TDP1CYP2A6 | |
| SCHEMBL144808 | 0.77 | TSHR (0.47) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL12817827 | 0.77 | TP53 (0.34) | TSHRACHECYP2A6CYP1A2 | |
| SCHEMBL27952763 | 0.75 | TSHR (0.45) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL9341909 | 0.73 | TSHR (0.43) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL21383259 | 0.73 | TSHR (0.43) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL9356901 | 0.71 | TSHR (0.41) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL1557214 | 0.71 | TSHR (0.53) | TSHRACHEALDH1A1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6025117-A | USING POLYSILANE COPOLYMER OR DENDRIMER FILM PATTERN AS MASK FOR ETCHING INSULATING OR CONDUCTING LAYER ON SUBSTRATE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0673960-B1 | Method for producing polysilanes | OSAKA GAS CO LTD (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5641849-A | Method for producing polysilanes | OSAKA GAS COMPANY LIMITED (JP) | 1997-06-24 | — | — | US | disclosed |
| EP-0673960-A1 | Method for producing polysilanes | OSAKA GAS CO., LTD. (JP) | 1995-09-27 | — | — | EP | disclosed |