SCHEMBL8219636

SCHEMBL8219636

CC(C)(C)OC(=O)OC(=Cc1ccccc1)OC(=O)OC(C)(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.43
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 2/20 0.39
TSHR P16473 2/20 0.39
NFKB1 P19838 1/20 0.39
NFKB2 Q00653 1/20 0.39
RELA Q04206 1/20 0.39
AKR1C1 Q04828 1/20 0.38
ELANE P08246 1/20 0.38
RECQL P46063 1/20 0.38
CYP2C19 P33261 1/20 0.38
MTNR1A P48039 2/20 0.37
MTNR1B P49286 2/20 0.37
HTT P42858 1/20 0.37
EGFR P00533 1/20 0.37
FBP1 P09467 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
NR1I2 O75469 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4936319 0.83 AKR1C3 (0.44) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL4936314 0.83 AKR1C3 (0.44) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL6512122 0.82 AKR1C3 (0.40) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL8775676 0.80 EGFR (0.49) MEN1KMT2AALDH1A1TSHRRECQL
SCHEMBL28423619 0.77 EGFR (0.49) MEN1KMT2AALDH1A1TSHRNFKB1
SCHEMBL13241270 0.77 MEN1 (0.58) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL2918522 0.76 AKR1C3 (0.55) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL7615069 0.75 AKR1C3 (0.50) AKR1C3MEN1KMT2AALDH1A1TSHR
SCHEMBL1905155 0.75 MEN1 (0.47) AKR1C3MEN1KMT2AALDH1A1TSHR
Toluene SCHEMBL17241461 0.74 TSHR (0.44) MEN1KMT2AALDH1A1TSHRELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6022665-A BLEND OF SOLVENT, MODIFIED STYRENE POLYMER AND PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-08 US disclosed
US-5844057-A Polymers and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-01 US disclosed