SCHEMBL8775676

SCHEMBL8775676

CC(C)(C)OC(=O)OC(C=Cc1ccccc1)=Cc1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 4/20 0.49
GLA P06280 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
ALDH1A1 P00352 4/20 0.44
KMT2A Q03164 4/20 0.44
LMNA P02545 3/20 0.44
NPC1 O15118 3/20 0.44
MEN1 O00255 2/20 0.44
RAB9A P51151 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
HDAC3 O15379 2/20 0.44
HDAC4 P56524 2/20 0.44
HDAC1 Q13547 2/20 0.44
HDAC2 Q92769 2/20 0.44
HDAC8 Q9BY41 2/20 0.44
HDAC6 Q9UBN7 2/20 0.44
MAPT P10636 3/20 0.43
PLIN1 O60240 2/20 0.43
RECQL P46063 2/20 0.43
PLIN5 Q00G26 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28423619 0.83 EGFR (0.49) EGFRGLATDP1ALDH1A1KMT2A
SCHEMBL8219636 0.80 AKR1C3 (0.43) EGFRTDP1ALDH1A1KMT2AMEN1
SCHEMBL6037018 0.78 KMT2A (0.49) EGFRGLATDP1ALDH1A1KMT2A
SCHEMBL3165399 0.78 MMP1 (0.44) EGFRTDP1ALDH1A1KMT2ALMNA
SCHEMBL4430391 0.77 EGFR (0.47) EGFRGLATDP1ALDH1A1KMT2A
SCHEMBL4936314 0.77 AKR1C3 (0.44) EGFRALDH1A1KMT2AMEN1RECQL
SCHEMBL4936319 0.77 AKR1C3 (0.44) EGFRALDH1A1KMT2AMEN1RECQL
SCHEMBL1006098 0.76 GLA (0.55) EGFRGLATDP1ALDH1A1KMT2A
SCHEMBL126771 0.76 GLA (0.55) EGFRGLATDP1ALDH1A1KMT2A
SCHEMBL6512122 0.76 AKR1C3 (0.40) EGFRALDH1A1KMT2AMEN1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5691110-A DISSOLVING POLYMER IN SOLVENT; HEATING LUCENT TECHNOLOGIES INC. (US) 1997-11-25 US disclosed
EP-0608983-B1 A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers AT & T CORP (US) 1997-11-12 EP disclosed
US-5385809-A Partially deprotecting a polymer having a pendant and labile alkoxycarbonyl or alkyl groups prior to use as a photoresist; lithography AT&T CORP. (US) 1995-01-31 US disclosed
EP-0608983-A1 A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers AT&T Corp. (US) 1994-08-03 EP disclosed