SCHEMBL8224403

SCHEMBL8224403

C=CC[Si](CC=C)(CC=C)c1ccccc1C=C

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10913604 0.82 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL3153813 0.79 ALDH1A1 (0.40) ALDH1A1TSHR
SCHEMBL669066 0.75
SCHEMBL1219524 0.75 ACHE (0.39) ALDH1A1TSHR
SCHEMBL23493448 0.71 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL29434633 0.71 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL5701401 0.71 ALDH1A1 (0.50) ALDH1A1TSHR
SCHEMBL373961 0.71 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL10623221 0.71
SCHEMBL10987337 0.71 ACHE (0.45) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0096596-B2 Microelectronic device manufacture NEC CORP (JP) 1994-03-23 EP claimed
US-4965340-A POSITTIVE TYPE RESIST MATERIAL; RESISTANT TO DRY ETCHING CHISSO CORPORATION (JP) 1990-10-23 US claimed
EP-0096596-B1 MICROELECTRONIC DEVICE MANUFACTURE NEC CORPORATION (JP) 1986-06-04 EP claimed
US-4551417-A Method of forming patterns in manufacturing microelectronic devices NEC CORPORATION (JP) 1985-11-05 US claimed
JP-62215628-A None JP disclosed
JP-2133408-A None JP disclosed
JP-2124906-A None JP disclosed
JP-2135203-A None JP disclosed
JP-2129247-A None JP disclosed
JP-7033879-A None JP disclosed
JP-2123110-A None JP disclosed
US-6025437-A Block-graft copolymer, self-crosslinked polymer solid electrolyte and composite solid electrolyte manufactured through use of the block-graft copolymer, and solid cell employing the composite solid electrolyte SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-15 US disclosed
EP-0395391-A2 Catalyst component for producing crystalline polymers and a process for producing the catalyst CHISSO CORPORATION (JP) 1990-10-31 EP disclosed
US-4965340-A POSITTIVE TYPE RESIST MATERIAL; RESISTANT TO DRY ETCHING CHISSO CORPORATION (JP) 1990-10-23 US disclosed
JP-H02135203-A TITANIUM CATALYST COMPONENT FOR PRODUCING OLEFINIC POLYMER AND PRODUCTION THEREOF CHISSO CORP 1990-05-24 JP disclosed
JP-H02133408-A TITANIUM TRICHLORIDE COMPOSITION FOR PREPARING OLEFIN POLYMER AND MANUFACTURE THEREOF CHISSO CORP 1990-05-22 JP disclosed
JP-H02129247-A POLYPROPYLENE COMPOSITION AND ITS PRODUCTION AND MOLDING CHISSO CORP 1990-05-17 JP disclosed
JP-H02124906-A PREPARATION OF POLYPROPYLENE CHISSO CORP 1990-05-14 JP disclosed
JP-H02123110-A PRODUCTION OF POLYPROPYLENE CHISSO CORP 1990-05-10 JP disclosed
JP-S62215628-A COPOLYMER OF SULFUR DIOXIDE AND NUCLEAR SUBSTITUTED TRIALKYLSILYLSTYRENE AND PRODUCTION THEREOF CHISSO CORP 1987-09-22 JP disclosed