SCHEMBL8225486

SCHEMBL8225486

CCC(=O)CC(=O)[O-].CCC(=O)CC(=O)[O-].CCC(=O)CC(=O)[O-].CCC(=O)CC(=O)[O-].[Zr+4]

nearest known ligand 0.56

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CA4 P22748 2/20 0.50
TDP1 Q9NUW8 2/20 0.50
FFAR3 O14843 3/20 0.41
HDAC3 O15379 2/20 0.41
HDAC1 Q13547 2/20 0.41
HDAC2 Q92769 2/20 0.41
HDAC8 Q9BY41 2/20 0.41
CA1 P00915 1/20 0.36
ALDH1A1 P00352 1/20 0.35
BBOX1 O75936 1/20 0.32
CA2 P00918 1/20 0.32
CASP1 P29466 1/20 0.32
CES2 O00748 1/20 0.32
CES1 P23141 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7635410 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1
SCHEMBL3802494 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1
SCHEMBL125102 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1
SCHEMBL5143342 0.94
Potassium Ion SCHEMBL14935705 0.94
Lithium Ion SCHEMBL25252562 0.94
SCHEMBL208043 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1
Zinc Ion SCHEMBL17459908 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1
SCHEMBL22398809 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1
SCHEMBL17433670 0.94 CA4 (0.50) CA4TDP1FFAR3HDAC3HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117581157-A Waterless lithographic printing plate precursor, method for producing waterless lithographic printing plate, method for sorting waterless lithographic printing plate, and method for producing printed matter 东丽株式会社 2024-02-20 CN disclosed
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
CN-109476811-B One-part low temperature cure coating formed via a dual layer cure mechanism 巴斯夫涂料有限公司 2022-02-11 CN disclosed
US-11094899-B2 Method for manufacturing field effect transistor and method for manufacturing wireless communication device TORAY INDUSTRIES, INC. 2021-08-17 US disclosed
CN-111433300-A Scratch-resistant and scratch-resistant automotive coatings 巴斯夫涂料有限公司 2020-07-17 CN disclosed
US-10636866-B2 Capacitor, method for manufacturing same, and wireless communication device using same TORAY INDUSTRIES, INC. (JP) 2020-04-28 US disclosed
US-10490748-B2 Rectifying element, method for producing same, and wireless communication device TORAY INDUSTRIES, INC. (JP) 2019-11-26 US disclosed
EP-3514822-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE Toray Industries, Inc. (JP) 2019-07-24 EP disclosed
US-20190198786-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2019-06-27 US disclosed
CN-109716491-A The manufacturing method of field effect transistor and the manufacturing method of wireless telecom equipment 东丽株式会社 2019-05-03 CN disclosed
CN-101735825-A Liquid crystal aligning agent, polyorganosiloxane, liquid crystal aligning film, forming method thereof and liquid crystal display element JSR CORP 2010-06-16 CN disclosed
CN-101724408-A Liquid crystal aligning agent, liquid crystal display device, and polyorganosiloxane JSR CORP 2010-06-09 CN disclosed
CN-101687996-A Polyorganosiloxane, liquid crystal alignment film, and liquid crystal display element JSR CORP 2010-03-31 CN disclosed
CN-101490176-A Oxide particle-containing resin composition and method for producing the same JSR CORP (JP) 2009-07-22 CN disclosed
CN-100376646-C Coating composition JSR CORP (JP) 2008-03-26 CN disclosed
CN-1675326-A Coating composition JSR CORP (JP) 2005-09-28 CN disclosed
CN-1445315-A Ray sensitive compasition for preparing insulation film and display JSR CORP (JP) 2003-10-01 CN disclosed
US-6063898-A N-VINYL CARBAMATE COMPOUND HAVING REACTIVE GROUP FOR THERMOSETTING OR PHOTOCURING OF RESIN; PHOTORESISTS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2000-05-16 US disclosed
EP-0899269-A1 NOVEL COMPOUNDS, POLYMERS OF THEM, PROCESSES FOR THE PREPARATION OF BOTH, AND COMPOSITIONS CONTAINING THE COMPOUNDS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1999-03-03 EP disclosed
CN-1016498-B PRESSURE-SENSITIVE ADHESIVE SHEETS KANSAI PAINT CO LTD (JP) 1992-05-06 CN disclosed