SCHEMBL822641

SCHEMBL822641

CCC1(COC)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14283288 0.91 TSHR (0.33)
SCHEMBL2852670 0.87 EPHX1 (0.38)
SCHEMBL10071384 0.82 TSHR (0.32)
SCHEMBL27431256 0.82
SCHEMBL28770059 0.82 TSHR (0.36)
SCHEMBL439901 0.82 TSHR (0.36)
SCHEMBL28061296 0.81 TSHR (0.33)
SCHEMBL1352530 0.81
SCHEMBL10071391 0.81 TSHR (0.32)
SCHEMBL26073685 0.80 TSHR (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 548 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6322892-B1 A) AN EPOXY GROUP-CONTAINING COMPOUND AND OPTIONALLY AN OXETANE COMPOUND; B) A MODIFIED DIMETHYLSILICONE OIL; C) A CATION-POLYMERIZATION INITIATOR WHICH FORMS A CATION BY IRRADIATION OR BY HEATING. KANSAI PAINT CO., LTD. (JP) 2001-11-27 US claimed
US-20250206970-A1 INK COMPOSITION, LIGHT-BLOCKING MEMBER AND IMAGE DISPLAY DEVICE NATOCO CO., LTD. (JP) 2025-06-26 US disclosed
WO-2024257521-A1 INK COMPOSITION, CURED PRODUCT, AND IMAGE DISPLAY DEVICE ナトコ株式会社 2024-12-19 WO disclosed
CN-118974186-A Ink composition, light shielding member, and image display device 耐涂可株式会社 2024-11-15 CN disclosed
WO-2024171549-A1 LAMINATE AND LAMINATE PRODUCTION METHOD ナトコ株式会社 2024-08-22 WO disclosed
CN-115279831-B Composition, cured product, and method for producing cured product 株式会社艾迪科 2024-05-31 CN disclosed
CN-114222773-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2024-04-09 CN disclosed
WO-2023210311-A1 ACTINIC RAY CURABLE INK COMPOSITION AND PRINTED MATTER 東洋インキSCホールディングス株式会社 2023-11-02 WO disclosed
EP-3559078-B1 MATERIALS FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2023-10-25 EP disclosed
WO-2023188856-A1 INK COMPOSITION, LIGHT-BLOCKING MEMBER AND IMAGE DISPLAY DEVICE ナトコ株式会社 2023-10-05 WO disclosed
EP-0345073-A1 Poly (3-(Substituted)-3(Hydroxymethyl) oxetane) and method of preparing same ARIZONA BOARD OF REGENTS (US) 1989-12-06 EP disclosed
EP-0345074-A1 High molecular weight polymers and copolymers of 3-hydroxyoxetane and derivatives thereof. ARIZONA BOARD OF REGENTS (US) 1989-12-06 EP disclosed
US-4833183-A FILMS, FIBERS, MOLDING MATERIALS EXPLOSIVES ARIZONA BOARD OF REGENTS (US) 1989-05-23 US disclosed
EP-0000722-B1 PROCESS FOR THE PREPARATION OF POLYURETHANES CONTAINING ARYLSULFONIC ACID ALKYL ESTER GROUPS BAYER AG (DE) 1982-09-29 EP disclosed
US-4237250-A Polyurethanes containing aryl sulfonic acid alkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-12-02 US disclosed
US-4211850-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-07-08 US disclosed
US-4201852-A Polyurethanes based on modified polyisocyanates containing sulphonic acid ester groups and process for the production thereof BAYER AKTIENGESELLSCHAFT (DE) 1980-05-06 US disclosed
US-4189562-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-02-19 US disclosed
EP-0000723-A1 Polyhydroxy compounds containing urethane-aryl-sulfonic acid-hydroxyalkyl ester groups, process for their preparation and their use as reaction components for the preparation of polyurethane resins BAYER AG (DE) 1979-02-21 EP disclosed
EP-0000722-A1 Process for the preparation of polyurethanes containing arylsulfonic acid alkyl ester groups BAYER AG (DE) 1979-02-21 EP disclosed