SCHEMBL8229332

SCHEMBL8229332

CC1(C)OB(c2cccnc2Br)OC1(C)C

nearest known ligand 0.37

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
LPL P06858 7/20 0.37
LIPG Q9Y5X9 7/20 0.37
TRIM24 O15164 1/20 0.35
TRIM33 Q9UPN9 1/20 0.35
CYP11B1 P15538 1/20 0.32
CYP11B2 P19099 1/20 0.32
LIPE Q05469 2/20 0.31
P2RX7 Q99572 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29446647 0.80 LPL (0.38) LPLLIPGLIPEP2RX7
SCHEMBL971840 0.80 LPL (0.38) LPLLIPGLIPEP2RX7
SCHEMBL17605016 0.79 LPL (0.37) LPLLIPGLIPE
SCHEMBL29468995 0.79 NOS3 (0.42) LPLLIPGLIPE
SCHEMBL2813914 0.79 LPL (0.40) LPLLIPGLIPE
SCHEMBL16473312 0.79 LPL (0.37) LPLLIPGLIPE
SCHEMBL31046590 0.79 LPL (0.40) LPLLIPGLIPE
SCHEMBL1114298 0.79 NOS3 (0.42) LPLLIPGLIPE
SCHEMBL29691149 0.77 LPL (0.36) LPLLIPGLIPE
SCHEMBL18865597 0.77 LPL (0.36) LPLLIPGLIPE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112086564-A Passivating agent and passivation method thereof and method for preparing semiconductor film 杭州纤纳光电科技有限公司 2020-12-15 CN claimed
CN-111435705-A Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2020-07-21 CN claimed
US-11935803-B2 Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-19 US disclosed
CN-111435705-B Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2023-04-07 CN disclosed
US-20210277221-A1 RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-09-09 US disclosed
EP-3786200-A1 RESIN COMPOSITION, LAMINATE, RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR WAFER, SUBSTRATE FOR MOUNTING RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-03 EP disclosed
CN-112086564-A Passivating agent and passivation method thereof and method for preparing semiconductor film 杭州纤纳光电科技有限公司 2020-12-15 CN disclosed
CN-111435705-A Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2020-07-21 CN disclosed
US-20160218389-A1 ELECTROLYTE FOR ELECTROCHEMICAL DEVICE AND THE ELECTROCHEMICAL DEVICE THEREOF TAIWAN HOPAX CHEMS. MFG. CO., LTD. (TW) 2016-07-28 US disclosed
US-20160218389-A1 ELECTROLYTE FOR ELECTROCHEMICAL DEVICE AND THE ELECTROCHEMICAL DEVICE THEREOF TAIWAN HOPAX CHEMS. MFG. CO., LTD. (TW) 2016-07-28 US disclosed
US-9343776-B2 Electrolyte for electrochemical device and the electrochemical device thereof Taiwan Hopax Chems. Mfg Co., Ltd. (TW) 2016-05-17 US disclosed
US-9024071-B2 Therapeutic compounds UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2015-05-05 US disclosed
US-9024071-B2 Therapeutic compounds UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2015-05-05 US disclosed
EP-2482374-B1 Electrolyte for electrochemical device and the electrochemical device thereof TAIWAN HOPAX CHEMS MFG CO LTD (TW) 2014-11-19 EP disclosed
US-20120196158-A1 ELECTROLYTE FOR ELECTROCHEMICAL DEVICE AND THE ELECTROCHEMICAL DEVICE THEREOF TAIWAN HOPAX CHEMS. MFG. CO., LTD. (TW) 2012-08-02 US disclosed
US-20120196158-A1 ELECTROLYTE FOR ELECTROCHEMICAL DEVICE AND THE ELECTROCHEMICAL DEVICE THEREOF TAIWAN HOPAX CHEMS. MFG. CO., LTD. (TW) 2012-08-02 US disclosed
EP-2482374-A1 Electrolyte for electrochemical device and the electrochemical device thereof Taiwan Hopax Chems. Mfg. Co., Ltd (TW) 2012-08-01 EP disclosed
US-20080021056-A1 Fused, Tricyclic Sulfonamide Inhibitors of Gamma Secretase ELAN PHARMACEUTICALS, INC. 2008-01-24 US disclosed
US-20080021056-A1 Fused, Tricyclic Sulfonamide Inhibitors of Gamma Secretase ELAN PHARMACEUTICALS, INC. 2008-01-24 US disclosed
WO-2007143523-A2 FUSED, TRICYCLIC SULFONAMIDE INHIBITORS OF GAMMA SECRETASE ELAN PHARMACEUTICALS, INC. (US) 2007-12-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080021056-A1 Fused, Tricyclic Sulfonamide Inhibitors of Gamma Secretase BACE1, BACE2, PSEN1 LPL 3954/4885LIPG 3623/4885TRIM24 3293/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.