SCHEMBL822956

SCHEMBL822956

O=C1CCCCC1S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL8878704 0.97
SCHEMBL822982 0.97
Cyclopentane SCHEMBL8879018 0.97 KMT2A (0.52)
SCHEMBL4989703 0.97 KMT2A (0.52)
SCHEMBL28983235 0.97 KMT2A (0.52)
SCHEMBL112763 0.97 KMT2A (0.52)
SCHEMBL11657362 0.97 KMT2A (0.52)
Cyclohexane SCHEMBL8879285 0.97 KMT2A (0.52)
Methane SCHEMBL27674323 0.95 KMT2A (0.50)
SCHEMBL823040 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080131389-A1 Hair Relaxer SHOWA DENKO K.K. (JP) 2008-06-05 US claimed
EP-1845940-A1 HAIR RELAXER Showa Denko K.K. (JP) 2007-10-24 EP claimed
WO-2006083031-A1 HAIR RELAXER SHOWA DENKO K.K. (JP) 2006-08-10 WO claimed
US-20030207049-A1 Liquid crystal display unit and method for manufacturing the same NEC CORPORATION 2003-11-06 US claimed
CN-111142332-B Photosensitive resin composition and photosensitive dry film 信越化学工业株式会社 2024-10-29 CN disclosed
CN-108693713-B Resist underlayer film material, pattern formation method, and resist underlayer film formation method 信越化学工业株式会社 2022-06-03 CN disclosed
US-20210177804-A1 DIARYL AND ARYLHETEROARYL UREA DERIVATIVES AS MODULATORS OF THE 5-HT2A SEROTONIN RECEPTOR USEFUL FOR THE PROPHYLAXIS AND TREATMENT OF HALLUCINATIONS ASSOCIATED WITH A NEURODEGENERATIVE DISEASE AXOVANT SCIENCES GMBH (CH) 2021-06-17 US disclosed
WO-2021029320-A1 FILM-FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN 三菱瓦斯化学株式会社 2021-02-18 WO disclosed
WO-2020039966-A1 FILM FORMATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2020-02-27 WO disclosed
WO-2020027206-A1 OPTICAL COMPONENT-FORMING COMPOSITION, OPTICAL COMPONENT, COMPOUND, AND RESIN 三菱瓦斯化学株式会社 2020-02-06 WO disclosed
CN-104969127-B Compound, lower layer film for lithography forming material, lower layer film for lithography and pattern forming method 三菱瓦斯化学株式会社 2019-11-26 CN disclosed
CN-106094440-B Lower layer film for lithography forming material, lower layer film for lithography and pattern forming method 三菱瓦斯化学株式会社 2019-11-22 CN disclosed
US-4962014-A USING SULFITE CONTAINING BLIXING LIQUID TO SHORTEN TIME AND REDUCE WATER CONSUMPTION WITHOUT IMPAIRING STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1990-10-09 US disclosed
US-4914007-A REDUCING THE WATER WASHING TIME OF CONTINUOUS COLOR DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 1990-04-03 US disclosed
EP-0304067-A2 Silver halide color photographic light-sensitive material containing epoxy compound Fuji Photo Film Co., Ltd. (JP) 1989-02-22 EP disclosed
EP-0276319-A1 SILVER HALIDE COLOR PHOTOGRAPHIC MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1988-08-03 EP disclosed
US-4588677-A 4-MERCAPTO-5-PYRAZOLONE TYPE MAGENTA COUPLERS FUJI PHOTO FILM CO., LTD. (JP) 1986-05-13 US disclosed
US-4584266-A 2-EQUIVALENT 5-PYRAZOLONE MAGENTA COUPLER FUJI PHOTO FILM CO., LTD. (JP) 1986-04-22 US disclosed
US-4556630-A NOVEL MAGENTA COUPLERS HAVING ARYLTHIO GROUP AT THE COUPLING ACTIVE POSITION OF A PYRAZOLONE FUJI PHOTO FILM CO., LTD. (JP) 1985-12-03 US disclosed
US-3985907-A Novel 3-furyl beta oxoalkyl sulfides, processes for producing same and methods for using same for altering the organoleptic properties of foodstuffs INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) 1976-10-12 US disclosed