⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cycloheptane SCHEMBL8877158 | 0.97 | KMT2A (0.42) | — | |
| SCHEMBL822956 | 0.92 | — | — | |
| SCHEMBL27851721 | 0.90 | CA1 (0.34) | — | |
| SCHEMBL4989703 | 0.89 | KMT2A (0.52) | — | |
| Methane SCHEMBL8878704 | 0.89 | — | — | |
| SCHEMBL112763 | 0.89 | KMT2A (0.52) | — | |
| Cyclohexane SCHEMBL8879285 | 0.89 | KMT2A (0.52) | — | |
| SCHEMBL822982 | 0.89 | — | — | |
| SCHEMBL11657362 | 0.89 | KMT2A (0.52) | — | |
| Cyclopentane SCHEMBL8879018 | 0.89 | KMT2A (0.52) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080131389-A1 | Hair Relaxer | SHOWA DENKO K.K. (JP) | 2008-06-05 | — | — | US | claimed |
| EP-1845940-A1 | HAIR RELAXER | Showa Denko K.K. (JP) | 2007-10-24 | — | — | EP | claimed |
| WO-2006083031-A1 | HAIR RELAXER | SHOWA DENKO K.K. (JP) | 2006-08-10 | — | — | WO | claimed |
| US-20240226106-A1 | INHIBITORS OF PLASMA KALLIKREIN | SHIRE HUMAN GENETIC THERAPIES (US) | 2024-07-11 | — | — | US | disclosed |
| CN-117616337-A | Film forming material for semiconductor, member forming material for semiconductor, process member forming material for semiconductor, underlayer film forming material, underlayer film, and semiconductor device | 株式会社艾迪科 | 2024-02-27 | — | — | CN | disclosed |
| CN-116490526-A | Compounds and compositions | 株式会社艾迪科 | 2023-07-25 | — | — | CN | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-108693713-A | Resist lower layer membrane material, pattern forming method and resist lower membrane forming method | 信越化学工业株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108693705-A | Resist lower layer membrane material, pattern forming method and resist lower membrane forming method | 信越化学工业株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-107533297-A | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, and pattern formation method | 三菱瓦斯化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-102117013-A | Photoresist composition | SUMITOMO CHEMICAL CO | 2011-07-06 | — | — | CN | disclosed |
| US-7968734-B2 | Organocatalysts and methods of use in chemical synthesis | STC.UNM (US) | 2011-06-28 | — | — | US | disclosed |
| CN-101889247-A | Composition for forming underlayer film for lithography and method for forming multilayer resist pattern | MITSUBISHI GAS CHEMICAL CO | 2010-11-17 | — | — | CN | disclosed |
| CN-101528653-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-09 | — | — | CN | disclosed |
| US-20080319206-A1 | Process for Preparing Protected Amidines | ASTRAZENECA AB (SE) | 2008-12-25 | — | — | US | disclosed |
| CN-101258018-A | Film forming composition for nanoimprinting and method for pattern formation | TOKYO OHKA KOGYO CO LTD (JP) | 2008-09-03 | — | — | CN | disclosed |
| US-20080131389-A1 | Hair Relaxer | SHOWA DENKO K.K. (JP) | 2008-06-05 | — | — | US | disclosed |
| EP-1845940-A1 | HAIR RELAXER | Showa Denko K.K. (JP) | 2007-10-24 | — | — | EP | disclosed |
| WO-2006083031-A1 | HAIR RELAXER | SHOWA DENKO K.K. (JP) | 2006-08-10 | — | — | WO | disclosed |