SCHEMBL825370

SCHEMBL825370

CCC(C)C(=O)Oc1ccccc1NC(=O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.52
KDM4E B2RXH2 2/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
RAB9A P51151 3/20 0.49
TP53 P04637 3/20 0.49
AHR P35869 2/20 0.49
NPC1 O15118 2/20 0.49
LMNA P02545 2/20 0.49
NR1I2 O75469 1/20 0.49
TAAR1 Q96RJ0 1/20 0.49
SMN1; SMN2 Q16637 3/20 0.48
HTT P42858 2/20 0.48
MEN1 O00255 2/20 0.48
ALDH1A1 P00352 1/20 0.48
GAA P10253 1/20 0.48
MDM4 O15151 2/20 0.48
POLB P06746 1/20 0.48
HPGD P15428 1/20 0.48
MAPT P10636 1/20 0.47
MAPK1 P28482 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825452 0.81 NPC1 (0.58) KMT2ARAB9ATP53NPC1LMNA
SCHEMBL825362 0.81 NPC1 (0.61) KMT2ARAB9ANPC1SMN1; SMN2HTT
SCHEMBL15548526 0.79 KMT2A (0.49) KMT2AKDM4EL3MBTL1MEN1ALDH1A1
SCHEMBL825445 0.79 MAPT (0.51) KMT2AL3MBTL1LMNASMN1; SMN2MEN1
SCHEMBL825597 0.78 KMT2A (0.67) KMT2AKDM4EL3MBTL1RAB9ATP53
SCHEMBL11575920 0.78 KMT2A (0.64) KMT2ARAB9ATP53AHRNPC1
SCHEMBL8970981 0.77 PTK2 (0.70) KMT2ARAB9ATP53AHRNPC1
SCHEMBL1096848 0.77 RAB9A (0.55) KMT2ARAB9ATP53AHRNPC1
SCHEMBL6959171 0.76 NPC1 (0.59) KMT2ARAB9ATP53AHRNPC1
SCHEMBL16685068 0.76 KMT2A (0.77) KMT2AKDM4ERAB9ATP53AHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed