SCHEMBL825445

SCHEMBL825445

CCC(C)C(=O)Oc1ccccc1OC(=O)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.51
KMT2A Q03164 3/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
SLC6A3 Q01959 1/20 0.50
LMNA P02545 2/20 0.47
MEN1 O00255 2/20 0.45
JAK2 O60674 1/20 0.45
USP2 O75604 1/20 0.45
ESR1 P03372 1/20 0.45
GAA P10253 1/20 0.45
ALOX15 P16050 1/20 0.45
NPSR1 Q6W5P4 1/20 0.45
ESR2 Q92731 1/20 0.45
HSD17B10 Q99714 1/20 0.45
TDP1 Q9NUW8 2/20 0.44
CYP3A4 P08684 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
ALDH1A1 P00352 1/20 0.44
SERPINE1 P05121 1/20 0.42
ADRB2 P07550 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15548526 0.88 KMT2A (0.49) MAPTKMT2AMEN1ALOX15NPSR1
SCHEMBL825436 0.84 KMT2A (0.54) MAPTKMT2ALMNAMEN1TDP1
SCHEMBL1914219 0.84 SLC6A3 (0.51) MAPTKMT2ASMN1; SMN2SLC6A3LMNA
SCHEMBL15550096 0.83 KMT2A (0.58) MAPTKMT2ASMN1; SMN2SLC6A3LMNA
SCHEMBL4085152 0.82 KMT2A (0.49) MAPTKMT2ASMN1; SMN2LMNAMEN1
SCHEMBL15547525 0.82 PTGS2 (0.47) KMT2ALMNAMEN1ESR1HSD17B10
SCHEMBL15547890 0.82 ALOX15 (0.47) MAPTKMT2ASMN1; SMN2MEN1ESR1
SCHEMBL17956355 0.82 KMT2A (0.49) MAPTKMT2ASMN1; SMN2SLC6A3LMNA
SCHEMBL825435 0.82 ELANE (0.56) MAPTKMT2ASLC6A3MEN1ESR1
SCHEMBL16673227 0.81 L3MBTL1 (0.57) MAPTKMT2AGAAALOX15NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed