SCHEMBL825408

SCHEMBL825408

CCC(C)(C)C(=O)Oc1ccccc1OC(=O)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.51
KMT2A Q03164 3/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
SLC6A3 Q01959 2/20 0.50
ELANE P08246 2/20 0.48
TDP1 Q9NUW8 4/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
NPSR1 Q6W5P4 2/20 0.46
CYP2D6 P10635 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2C19 P33261 1/20 0.46
MEN1 O00255 2/20 0.45
HSD17B10 Q99714 2/20 0.45
JAK2 O60674 1/20 0.45
USP2 O75604 1/20 0.45
ESR1 P03372 1/20 0.45
GAA P10253 1/20 0.45
ALOX15 P16050 1/20 0.45
ESR2 Q92731 1/20 0.45
CYP3A4 P08684 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825503 0.84 MAPT (0.62) MAPTKMT2AELANETDP1L3MBTL1
SCHEMBL15548022 0.83 ELANE (0.66) MAPTKMT2ASMN1; SMN2SLC6A3ELANE
SCHEMBL16672587 0.82 POLB (0.46) MAPTKMT2ASMN1; SMN2ELANEL3MBTL1
SCHEMBL825357 0.82 ELANE (0.73) MAPTSLC6A3ELANETDP1HSD17B10
SCHEMBL16672965 0.81 L3MBTL1 (0.53) MAPTKMT2AELANEL3MBTL1NPSR1
SCHEMBL825441 0.81 KMT2A (0.50) MAPTKMT2AELANETDP1L3MBTL1
SCHEMBL825366 0.80 MAPT (0.56) MAPTKMT2ASMN1; SMN2ELANETDP1
SCHEMBL28213186 0.79 KDM4E (0.57) MAPTKMT2AELANETDP1L3MBTL1
SCHEMBL725404 0.79 KMT2A (0.76) MAPTKMT2ASMN1; SMN2SLC6A3TDP1
SCHEMBL13212295 0.79 ELANE (0.45) MAPTKMT2AELANEJAK2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed