SCHEMBL825503

SCHEMBL825503

CCC(C)(C)C(=O)Oc1ccc(OC(=O)c2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.62
TDP1 Q9NUW8 3/20 0.62
L3MBTL1 Q9Y468 1/20 0.62
ELANE P08246 7/20 0.54
KMT2A Q03164 7/20 0.54
ALDH1A1 P00352 3/20 0.54
PKM P14618 1/20 0.54
PARP10 Q53GL7 1/20 0.53
MEN1 O00255 4/20 0.49
RAB9A P51151 1/20 0.48
KDM4E B2RXH2 1/20 0.47
HSP90AA1 P07900 1/20 0.47
HPGD P15428 1/20 0.47
CYP1A2 P05177 1/20 0.46
CYP2D6 P10635 1/20 0.46
CYP2C19 P33261 1/20 0.46
LMNA P02545 1/20 0.44
TSHR P16473 1/20 0.44
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825366 0.95 MAPT (0.56) MAPTTDP1L3MBTL1ELANEKMT2A
SCHEMBL825441 0.90 KMT2A (0.50) MAPTTDP1L3MBTL1ELANEKMT2A
SCHEMBL825379 0.88 ESR1 (0.52) MAPTTDP1L3MBTL1ELANEKMT2A
SCHEMBL825593 0.88 ELANE (0.71) ELANE
SCHEMBL15071417 0.88 ELANE (0.58) MAPTTDP1L3MBTL1ELANE
SCHEMBL131278 0.87 ELANE (0.51) MAPTTDP1L3MBTL1ELANE
SCHEMBL825408 0.84 MAPT (0.51) MAPTTDP1L3MBTL1ELANEKMT2A
SCHEMBL14827287 0.84 ELANE (0.58) L3MBTL1ELANEKMT2AALDH1A1PARP10
SCHEMBL683318 0.84 ELANE (0.50) MAPTTDP1L3MBTL1ELANEKMT2A
SCHEMBL25468064 0.83 ELANE (0.48) MAPTTDP1L3MBTL1ELANEKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed