Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | FABP3 | P05413 | 2/20 | 0.44 |
| ▸ | FABP7 | O15540 | 1/20 | 0.44 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.44 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.43 |
| ▸ | RXRA | P19793 | 1/20 | 0.42 |
| ▸ | RXRB | P28702 | 1/20 | 0.42 |
| ▸ | RXRG | P48443 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28779295 | 0.85 | KDM4E (0.49) | KDM4EPKMKMT2AMEN1LMNA | |
| SCHEMBL15548526 | 0.85 | KMT2A (0.49) | KDM4EKMT2AMEN1MAPTALDH1A1 | |
| SCHEMBL14827288 | 0.84 | BACE1 (0.43) | KDM4EPKMKMT2AMEN1LMNA | |
| SCHEMBL23518659 | 0.83 | FABP3 (0.49) | KDM4EPKMKMT2AMEN1LMNA | |
| SCHEMBL14827298 | 0.82 | KDM4E (0.60) | KDM4EPKMKMT2AMEN1LMNA | |
| SCHEMBL2058257 | 0.80 | KDM4E (0.53) | KDM4EPKMKMT2AMEN1LMNA | |
| SCHEMBL17720809 | 0.79 | KDM4E (0.49) | KDM4EPKMKMT2AMEN1LMNA | |
| SCHEMBL4085152 | 0.79 | KMT2A (0.49) | KDM4EKMT2AMEN1LMNAMAPT | |
| SCHEMBL15547890 | 0.79 | ALOX15 (0.47) | KDM4EKMT2AMEN1MAPTALDH1A1 | |
| SCHEMBL4090840 | 0.79 | TDP1 (0.48) | KDM4EKMT2AHTTALDH1A1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9915870-B2 | Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2018-03-13 | — | — | US | disclosed |
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9551933-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9527809-B2 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160320700-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-9470980-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2016-10-18 | — | — | US | disclosed |
| US-9448477-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20110043932-A1 | LENS DEVICE | FUJIFILM CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110026109-A1 | OPTICAL LENS, OPTICAL SYSTEM UNIT AND IMAGING APPARATUS | FUJIFILM CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20110026109-A1 | OPTICAL LENS, OPTICAL SYSTEM UNIT AND IMAGING APPARATUS | FUJIFILM CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20100296181-A1 | PLASTIC LENS | FUJIFILM CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100296181-A1 | PLASTIC LENS | FUJIFILM CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100225013-A1 | METHOD FOR PRODUCING OPTICAL MEMBER AND OPTICAL MEMBER FORMED BY THE PRODUCTION PROCESS | FUJIFILM CORPORATION (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100225013-A1 | METHOD FOR PRODUCING OPTICAL MEMBER AND OPTICAL MEMBER FORMED BY THE PRODUCTION PROCESS | FUJIFILM CORPORATION (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100104842-A1 | ORGANIC-INORGANIC HYBRID COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20090035548-A1 | ORGANIC-INORGANIC HYBRID COMPOSITION, METHOD FOR PRODUCING THE SAME, MOLDING AND OPTICAL COMPONENT | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |