Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 7/20 | 0.53 |
| ▸ | MAPT | P10636 | 4/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | SERPINE1 | P05121 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 1/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | ELANE | P08246 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825513 | 0.93 | MAPT (0.49) | KMT2AMAPTTDP1MEN1ALDH1A1 | |
| SCHEMBL825436 | 0.90 | KMT2A (0.54) | KMT2AMAPTTDP1MEN1ALDH1A1 | |
| SCHEMBL825605 | 0.88 | ELANE (0.53) | KMT2AMAPTTDP1MEN1ALDH1A1 | |
| SCHEMBL17138193 | 0.88 | KMT2A (0.47) | KMT2AMAPTTDP1MEN1ALDH1A1 | |
| SCHEMBL825600 | 0.88 | TSHR (0.46) | KMT2AMAPTTDP1ALDH1A1ESR1 | |
| SCHEMBL825541 | 0.86 | ELANE (0.54) | MAPTTDP1ALDH1A1LMNAL3MBTL1 | |
| SCHEMBL14998124 | 0.85 | KMT2A (0.55) | KMT2AMAPTPKM | |
| SCHEMBL16300529 | 0.85 | ELANE (0.59) | KMT2AMAPTTDP1MEN1ALDH1A1 | |
| SCHEMBL9987065 | 0.84 | KMT2A (0.51) | KMT2AMAPTTDP1MEN1ALDH1A1 | |
| SCHEMBL9987068 | 0.84 | KMT2A (0.51) | KMT2AMAPTTDP1MEN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20140295332-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8142977-B2 | mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator | FUJIFILM CORPORATION (JP) | 2012-03-27 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |