SCHEMBL825513

SCHEMBL825513

CCC(C)C(=O)Oc1cccc(C(=O)Oc2ccccc2)c1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.49
TDP1 Q9NUW8 2/20 0.49
SERPINE1 P05121 1/20 0.49
ESR1 P03372 1/20 0.49
ESR2 Q92731 1/20 0.49
KMT2A Q03164 6/20 0.46
ELANE P08246 1/20 0.46
MAPK1 P28482 1/20 0.45
MEN1 O00255 2/20 0.44
NSD2 O96028 1/20 0.44
ALDH1A1 P00352 2/20 0.44
POLB P06746 1/20 0.43
CASP3 P42574 1/20 0.43
SENP8 Q96LD8 1/20 0.43
SENP7 Q9BQF6 1/20 0.43
SENP6 Q9GZR1 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825491 0.93 KMT2A (0.53) MAPTTDP1SERPINE1ESR1ESR2
SCHEMBL825436 0.88 KMT2A (0.54) MAPTTDP1KMT2AELANEMEN1
SCHEMBL825541 0.87 ELANE (0.54) MAPTTDP1ELANEMAPK1ALDH1A1
SCHEMBL825605 0.87 ELANE (0.53) MAPTTDP1KMT2AELANEMEN1
SCHEMBL14998124 0.87 KMT2A (0.55) MAPTKMT2APOLBSMN1; SMN2
SCHEMBL650639 0.85 ELANE (0.50) MAPTTDP1KMT2AELANEMAPK1
SCHEMBL14996055 0.85 ELANE (0.50) MAPTTDP1KMT2AELANEMAPK1
SCHEMBL17617137 0.85 ELANE (0.50) MAPTTDP1KMT2AELANEMAPK1
SCHEMBL17138193 0.83 KMT2A (0.47) MAPTTDP1KMT2AMAPK1MEN1
SCHEMBL825480 0.81 RXRA (0.52) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed