SCHEMBL825514

SCHEMBL825514

CCC(C)(C)C(=O)Oc1cccc(NC(=O)c2ccccc2)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 3/20 0.61
▸ RAB9A P51151 3/20 0.61
▸ NLRP3 Q96P20 1/20 0.61
▸ MAPK1 P28482 1/20 0.57
▸ MAPT P10636 4/20 0.57
▸ POLB P06746 1/20 0.57
▸ KMT2A Q03164 6/20 0.56
▸ MEN1 O00255 5/20 0.56
▸ KCNK9 Q9NPC2 4/20 0.55
▸ KCNK3 O14649 2/20 0.55
▸ TRPV1 Q8NER1 1/20 0.53
▸ HTT P42858 2/20 0.53
▸ RXFP1 Q9HBX9 1/20 0.52
▸ CYP1A2 P05177 1/20 0.52
▸ CYP3A4 P08684 1/20 0.52
▸ GAA P10253 1/20 0.52
▸ CYP2C9 P11712 1/20 0.52
▸ CYP2C19 P33261 1/20 0.52
▸ THRB P10828 1/20 0.52
▸ ALDH1A1 P00352 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825380 0.86 NPC1 (0.58) NPC1RAB9AMAPK1MAPTKMT2A
SCHEMBL825441 0.80 KMT2A (0.50) MAPTKMT2AMEN1CYP1A2CYP2C19
SCHEMBL825546 0.80 ELANE (0.54) NPC1RAB9AMAPK1POLBCYP2C9
SCHEMBL825497 0.80 MAPT (0.54) NPC1RAB9ANLRP3MAPK1MAPT
SCHEMBL12892540 0.80 NPC1 (0.57) NPC1RAB9APOLBKMT2ACYP2C9
SCHEMBL825379 0.79 ESR1 (0.52) NPC1RAB9AMAPK1MAPTPOLB
SCHEMBL10294107 0.79 RAB9A (0.71) NPC1RAB9ANLRP3MAPK1MAPT
SCHEMBL10294799 0.79 KMT2A (0.78) NPC1RAB9ANLRP3MAPK1MAPT
SCHEMBL23367928 0.78 RAB9A (0.75) NPC1RAB9ANLRP3MAPK1MAPT
SCHEMBL14572770 0.78 MAPT (0.76) NPC1RAB9ANLRP3MAPK1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 — — US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 — — US disclosed
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