Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 10/20 | 0.54 |
| ▸ | STS | P08842 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | PPARA | Q07869 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12892540 | 0.88 | NPC1 (0.57) | ELANENPC1POLBCYP2C9RAB9A | |
| SCHEMBL825379 | 0.87 | ESR1 (0.52) | ELANEL3MBTL1TDP1MAPK1NPC1 | |
| SCHEMBL825593 | 0.87 | ELANE (0.71) | ELANEPPARA | |
| SCHEMBL825441 | 0.86 | KMT2A (0.50) | ELANEL3MBTL1TDP1 | |
| SCHEMBL131278 | 0.83 | ELANE (0.51) | ELANEL3MBTL1ATMTDP1PPARA | |
| SCHEMBL825350 | 0.82 | RXRA (0.48) | — | |
| SCHEMBL18135084 | 0.82 | CYP3A4 (0.57) | ELANETDP1LMNANPC1RAB9A | |
| SCHEMBL19888151 | 0.81 | ELANE (0.57) | ELANELMNAMAPK1SRD5A2POLB | |
| SCHEMBL25468124 | 0.81 | NPC1 (0.42) | ELANELMNANPC1POLBCYP2C9 | |
| SCHEMBL2742153 | 0.80 | CYP3A4 (0.59) | ELANEPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12018107-B2 | Polymer material, composition, and method of manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| US-8142977-B2 | mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator | FUJIFILM CORPORATION (JP) | 2012-03-27 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |