Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 10/20 | 0.71 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.51 |
| ▸ | RAB9A | P51151 | 2/20 | 0.51 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825436 | 0.88 | KMT2A (0.54) | ELANEALDH1A1RAB9AMAPTLMNA | |
| SCHEMBL14996055 | 0.87 | ELANE (0.50) | ELANEALDH1A1RAB9AGAAMAPT | |
| SCHEMBL650639 | 0.87 | ELANE (0.50) | ELANEALDH1A1RAB9AGAAMAPT | |
| SCHEMBL17617137 | 0.87 | ELANE (0.50) | ELANEALDH1A1RAB9AGAAMAPT | |
| SCHEMBL825541 | 0.87 | ELANE (0.54) | ELANEALDH1A1RAB9ASMN1; SMN2MAPT | |
| SCHEMBL825605 | 0.86 | ELANE (0.53) | ELANEALDH1A1RAB9ASMN1; SMN2MAPT | |
| SCHEMBL19862709 | 0.86 | ELANE (0.61) | ELANEALDH1A1RAB9AGAAABCB1 | |
| SCHEMBL9338697 | 0.85 | MAPT (0.57) | ELANEALDH1A1MAPTHTTMAPK1 | |
| SCHEMBL10415112 | 0.85 | MAPT (0.57) | ELANEALDH1A1MAPTHTTMAPK1 | |
| SCHEMBL14827291 | 0.84 | NPY5R (0.50) | ELANEALDH1A1RAB9AMAPK1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9915870-B2 | Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2018-03-13 | — | — | US | disclosed |
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9551933-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9527809-B2 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160320700-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-9470980-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2016-10-18 | — | — | US | disclosed |
| US-9448477-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-7940355-B2 | Cellulose acylate film, and polarizing plate and liquid crystal display device using the same | FUJIFILM CORPORATION (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7678507-B2 | Latent holographic media and method | INPHASE TECHNOLOGIES, INC. (US) | 2010-03-16 | — | — | US | disclosed |
| US-20090103014-A1 | Cellulose Acylate Film, and Polarizing Plate and Liquid Crystal Display Device Using the Same | FUJI FILM CORPORATION (JP) | 2009-04-23 | — | — | US | disclosed |
| US-7494611-B2 | Cellulose ester film, cellulose ester dope, protective film of polarizing plate and polarizing plate | KONICA CORPORATION (JP) | 2009-02-24 | — | — | US | disclosed |
| US-7445831-B2 | Radiation curable low stress relaxation elastomeric materials | THE PROCTER & GAMBLE COMPANY (US) | 2008-11-04 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080032067-A1 | Cellulose acylate film, and polarizing plate and liquid crystal display device using the same | FUJIFILM CORPORATION (JP) | 2008-02-07 | — | — | US | disclosed |
| US-7306895-B2 | Pattern forming method, image forming method, fine particle adsorption pattern forming method, conductive pattern forming method, pattern forming material and planographic printing plate | FUJIFILM CORPORATION (JP) | 2007-12-11 | — | — | US | disclosed |
| US-7279195-B2 | Method of forming metal fine particle pattern and method of forming electroconductive pattern | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-20070166625-A1 | Latent holographic media and method | INPHASE TECHNOLOGIES, INC. (US) | 2007-07-19 | — | — | US | disclosed |