Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
| ▸ | KCNN4 | O15554 | 2/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | CYP3A5 | P20815 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.40 |
| ▸ | HTR2C | P28335 | 1/20 | 0.40 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.40 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.40 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | CES1 | P23141 | 1/20 | 0.34 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.33 |
| ▸ | ACP3 | P15309 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dicofol SCHEMBL8344827 | 0.88 | TSHR (0.67) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL30869981 | 0.87 | TSHR (0.65) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL30869980 | 0.87 | TSHR (0.65) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL9181207 | 0.87 | TSHR (0.65) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL4592612 | 0.80 | KCNN4 (0.46) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL11498640 | 0.78 | KCNN4 (0.45) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL11260814 | 0.77 | KCNN4 (0.55) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL5864393 | 0.77 | KCNN4 (0.55) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL29617470 | 0.76 | TSHR (0.53) | TSHRMAPK1HIF1AKCNN4CYP19A1 | |
| SCHEMBL197704 | 0.76 | TSHR (0.53) | TSHRMAPK1HIF1AKCNN4CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 442 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3578542-B1 | COMPOSITIONS HAVING PESTICIDAL UTILITY AND PROCESSES RELATED THERETO | CORTEVA AGRISCIENCE LLC (US) | 2025-11-12 | — | — | EP | claimed |
| EP-3578543-B1 | COMPOSITIONS COMPRISING MOLECULES HAVING PESTICIDAL UTILITY AND PROCESSES RELATED THERETO | CORTEVA AGRISCIENCE LLC (US) | 2025-08-20 | — | — | EP | claimed |
| EP-3578541-B1 | COMPOSITIONS COMPRISING MOLECULES HAVING PESTICIDAL UTILITY, AND PROCESSES RELATED THERETO | CORTEVA AGRISCIENCE LLC (US) | 2025-05-28 | — | — | EP | claimed |
| US-20180315596-A1 | CHEMICAL AMPLIFICATION METHODS AND TECHNIQUES FOR DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATINGS AND DYED IMPLANT RESISTS | TOKYO ELECTRON LIMITED (JP) | 2018-11-01 | — | — | US | claimed |
| US-20180246404-A1 | I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE | YCCHEM CO., LTD. (KR) | 2018-08-30 | — | — | US | claimed |
| US-10020195-B2 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | TOKYO ELECTRON LIMITED (JP) | 2018-07-10 | — | — | US | claimed |
| US-9618848-B2 | Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes | TOKYO ELECTRON LIMITED (JP) | 2017-04-11 | — | — | US | claimed |
| US-20150241783-A1 | Methods and Techniques to use with Photosensitized Chemically Amplified Resist Chemicals and Processes | TOKYO ELECTRON LIMITED (JP) | 2015-08-27 | — | — | US | claimed |
| US-20150241782-A1 | Chemical Amplification Methods and Techniques for Developable Bottom Anti-reflective Coatings and Dyed Implant Resists | TOKYO ELECTRON LIMITED (JP) | 2015-08-27 | — | — | US | claimed |
| US-7670749-B2 | Resist material and method for forming a patterned resist layer on a substrate | THE UNIVERSITY OF BIRMINGHAM (GB) | 2010-03-02 | — | — | US | claimed |
| EP-0462391-A2 | Acid hardened photoresists | SHIPLEY COMPANY INC. (US) | 1991-12-27 | — | — | EP | claimed |
| US-5075512-A | Dissolving in polar solvent mixture, then solvent extraction with n-decane; reuse | SOCIEDAD ESPANOLA DE DESARROLLOS QUIMICOS S.A. (ES) | 1991-12-24 | — | — | US | claimed |
| EP-0257845-B1 | METHOD OF PRODUCING VARIEGATED PLANTS | Taguchi, Masayasu (JP) | 1991-10-16 | — | — | EP | claimed |
| US-5034304-A | Halogenated compositions for negative images | ROHM AND HAAS COMPANY (US) | 1991-07-23 | — | — | US | claimed |
| EP-0409689-A2 | A process for the purification of 1,1-bis(4-chlorophenyl)-2,2,2-trichloroethanol | ELF ATOCHEM S.A. (FR) | 1991-01-23 | — | — | EP | claimed |
| EP-0407086-A2 | Melamine-containing photoresists of improved sensitivity | ROHM AND HAAS COMPANY (US) | 1991-01-09 | — | — | EP | claimed |
| EP-0404499-A2 | Photosensitive compositions comprising selected photoactive materials and their use in producing high resolution, photoresist images with near ultraviolet radiation | ROHM AND HAAS COMPANY (US) | 1990-12-27 | — | — | EP | claimed |
| EP-0257845-A2 | Method of producing variegated plants | Taguchi, Masayasu (JP) | 1988-03-02 | — | — | EP | claimed |
| EP-0248954-A1 | Process for reducing the amount of DDT-related impurities in 1,1-bis(chlorophenyl)-2,2,2-trichloro-ethanol | ROHM AND HAAS COMPANY (US) | 1987-12-16 | — | — | EP | claimed |
| US-4705902-A | DDTR-free 1,1-bis(chlorophenyl)-2,2,2-trichloroethanol | ROHM AND HAAS COMPANY (US) | 1987-11-10 | — | — | US | claimed |