SCHEMBL831880

SCHEMBL831880

CCCCCCCCOc1ccc(O)c(-n2nc3ccccc3n2)c1

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.52
LMNA P02545 1/20 0.52
RAB9A P51151 1/20 0.52
NR5A1 Q13285 1/20 0.47
GPBAR1 Q8TDU6 2/20 0.43
PTPN11 Q06124 1/20 0.43
CYSLTR2 Q9NS75 1/20 0.43
CYSLTR1 Q9Y271 1/20 0.43
TSHR P16473 1/20 0.43
LTA4H P09960 2/20 0.42
FGFR1 P11362 1/20 0.41
KDM4E B2RXH2 1/20 0.41
CNR2 P34972 2/20 0.41
PDK2 Q15119 1/20 0.41
PLA2G4B P0C869 2/20 0.41
TLR8 Q9NR97 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29768249 0.96 NPC1 (0.56) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL9408814 0.96 NPC1 (0.56) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL10620345 0.91 LMNA (0.56) NPC1LMNARAB9AGPBAR1CYSLTR2
SCHEMBL9744615 0.90 NR5A1 (0.50) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL5445426 0.90 NR5A1 (0.50) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL13370102 0.90 NR5A1 (0.50) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL45837 0.90 NR5A1 (0.50) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL29463600 0.85 GPBAR1 (0.46) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL7141357 0.85 GPBAR1 (0.46) NPC1LMNARAB9ANR5A1GPBAR1
SCHEMBL2806065 0.85 NPC1 (0.59) NPC1LMNARAB9AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6201061-B1 CURING A RESIN FOR OPTICAL USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-03-13 US claimed
EP-2007587-B1 INKJET RECORDING METHOD RICOH CO LTD (JP) 2013-07-24 EP disclosed
CN-101842441-B Resin composition TEIJIN CHEMICALS LTD 2013-04-17 CN disclosed
EP-2063295-B1 Fluorescent retroreflective sheeting NIPPON CARBIDE KOGYO KK (JP) 2012-04-18 EP disclosed
US-8142849-B2 Recording media, recording media-ink set, inkjet recording method and inkjet recording apparatus RICOH COMPANY, LTD. (JP) 2012-03-27 US disclosed
US-20100276073-A1 Surface Substrate Film for Motor Vehicle Brade Disc Antirust Film LINTEC CORPORATION 2010-11-04 US disclosed
CN-101842441-A Resin composition TEIJIN CHEMICALS LTD 2010-09-22 CN disclosed
EP-1748382-B1 Integrated circuit enclosed retroreflective product NIPPON CARBIDE KOGYO KK (JP) 2010-07-07 EP disclosed
US-20090291213-A1 RECORDING MEDIA, RECORDING MEDIA-INK SET, INKJET RECORDING METHOD AND INKJET RECORDING APPARATUS RICOH COMPANY, LTD. (JP) 2009-11-26 US disclosed
EP-1903481-B1 Integrated circuit enclosed retroreflective product NIPPON CARBIDE KOGYO KK (JP) 2009-10-28 EP disclosed
US-5981115-A RECORDING LAYER COMPRISES A RESIN AN ISOCYANATE COMPOUND CROSSLINKED WITH RESIN, ELECTRON DONATING COLORING AGENT AND AN ELECTRON ACCEPTING COLORING DEVELOPER RICOH COMPANY, LTD. (JP) 1999-11-09 US disclosed
EP-0950905-A2 Process for producing a novel resin for optical materials having excellent color tone and transparency MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-10-20 EP disclosed
EP-0065574-B1 PHOTOSYNTHETIC BACTERIA CULTURE NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1986-05-21 EP disclosed
US-4472546-A BLENDS WITH A2-(O-HYDROXYPHENYL)BENZOTRIAZOLE, 2-HYDROXYBENZOPHENONE, ORGANIC PHOSPHITE AND HINDERED PHENOL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1984-09-18 US disclosed
US-4467035-A Cultivation of phototrophic bacteria in the absence of ultraviolet light NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1984-08-21 US disclosed
EP-0099231-A2 Polyphenylene ether resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1984-01-25 EP disclosed
EP-0065574-A1 PHOTOSYNTHETIC BACTERIA CULTURE NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1982-12-01 EP disclosed
US-4344830-A WEATHERPROOFING GENERAL ELECTRIC COMPANY (US) 1982-08-17 US disclosed
US-4299886-A WITH POLYSILOXANES DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1981-11-10 US disclosed
US-4235043-A Method for cultivating algae and a covering material used therefor Nippon Carbide Kogyo Kabashiki Kaisha (JP) 1980-11-25 US disclosed