SCHEMBL8335158

SCHEMBL8335158

[CH2]COC(=O)CCc1cc(CCCC)c(O)c(CCCC)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 6/20 0.39
EGFR P00533 1/20 0.39
CYP4F2 P78329 1/20 0.38
CYP4A11 Q02928 1/20 0.38
LTA4H P09960 1/20 0.38
DGKA P23743 1/20 0.37
ALDH1A1 P00352 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
APP P05067 1/20 0.36
NPC1 O15118 1/20 0.36
HPGD P15428 1/20 0.36
MAPK1 P28482 1/20 0.36
HTT P42858 1/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CNR2 P34972 1/20 0.35
PTGS2 P35354 3/20 0.35
IAPP P10997 1/20 0.35
NFKB1 P19838 1/20 0.35
NFKB2 Q00653 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9418228 0.90 ALOX5 (0.45) ALOX5EGFRCYP4F2CYP4A11DGKA
SCHEMBL18269260 0.90 DGKA (0.47) ALOX5EGFRCYP4F2CYP4A11DGKA
SCHEMBL7047486 0.88 CYP4F2 (0.50) ALOX5EGFRCYP4F2CYP4A11DGKA
SCHEMBL13267547 0.87 ALOX5 (0.45) ALOX5EGFRCYP4F2CYP4A11DGKA
SCHEMBL11043991 0.85 EGFR (0.40) ALOX5EGFRLTA4HNPC1HPGD
SCHEMBL14244988 0.84 DGKA (0.50) DGKACNR2
SCHEMBL14244745 0.84 DGKA (0.50) DGKACNR2
SCHEMBL1066945 0.84 DGKA (0.50) DGKACNR2
SCHEMBL14245258 0.84 DGKA (0.50) DGKACNR2
SCHEMBL1565185 0.84 ALOX5 (0.38) ALOX5EGFRCYP4F2CYP4A11DGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5948844-A ALIPHATIC CARBOXYLIC ACID METAL SALT IS ADDED TO A TERMINALLY STABILIZED POLYACETAL RESIN, SAID SALT HAVING OCCLUDED THEREIN AT LEAST ONE METAL COMPOUND SELECTED FROM THE GROUP CONSISTING OF A METAL HYDROXIDE AND A METAL CHLORIDE ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1999-09-07 US disclosed